Antibacterial and barrier properties of oriented polymer films with ZnO thin films applied with atomic layer deposition at low temperatures

Autor: Vähä-Nissi, Mika, Pitkänen, Marja, Salo, Erkki, Kenttä, Eija, Tanskanen, Anne, Sajavaara, Timo, Putkonen, Matti, Sievänen, Jenni, Sneck, Asko, Rättö, Marjaana, Karppinen, Maarit, Harlin, Ali

Publikováno v: In Thin Solid Films 1 July 2014 562:331-337

Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition

Autor: Hirvikorpi, Terhi, Laine, Risto, Vähä-Nissi, Mika, Kilpi, Väinö, Salo, Erkki, Li, Wei-Min, Lindfors, Sven, Vartiainen, Jari, Kenttä, Eija, Nikkola, Juha, Harlin, Ali, Kostamo, Juhana

Publikováno v: In Thin Solid Films 1 January 2014 550:164-169

Adjusting wetting and adhesion characteristics with ALD and MLD

Autor: Vähä-Nissi, Mika, Salo, Erkki, Sievãnen, Jenni, Putkonen, Matti, Kenttä, Eija, Harlin, Ali

Publikováno v: Vähä-Nissi, M, Salo, E, Sievãnen, J, Putkonen, M, Kenttä, E & Harlin, A 2014, Adjusting wetting and adhesion characteristics with ALD and MLD . in TAPPI 2014 PLACE Conference Proceedings . vol. 2, TAPPI Press, pp. 1062-1091, TAPPI 2014 PLACE Conference, Ponte Vedra, Florida, United States, 13/05/14 . < https://imisrise.tappi.org/TAPPI/Products/14/PLA/14PLA35.aspx >

Atomic and molecular layer deposition (ALD and MLD, respectively) are based on repeated cycles of gas-solid surface reactions. A monolayer of precursor molecules is chemisorbed onto the surface during a single deposition cycle, enabling control of th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=355e65625b88::4dab36d490fa68b4a426cef07a7de313
https://cris.vtt.fi/en/publications/57201c88-907a-4a4c-a53d-86a4a9910d56

Atomic layer deposited thin barrier films for packaging

Autor: Pitkänen, Marja, Vähä-Nissi, Mika, Salo, Erkki, Sievänen, Jenni, Kenttä, Eija, Putkonen, Matti, Rättö, Marjaana, Harlin, Ali

Publikováno v: Pitkänen, M, Vähä-Nissi, M, Salo, E, Sievänen, J, Kenttä, E, Putkonen, M, Rättö, M & Harlin, A 2014, Atomic layer deposited thin barrier films for packaging . in PTS Symposium, Innovative Packaging 2014, Joint conference of PTS and COST Action FP1003 : Abstracts PTS GV 1473 . PTS, Munich, Germany, pp. 71-86, PTS Symposium of Innovative Packaging, München, Germany, 20/05/14 .

Atomic layer deposition (ALD) is a surface controlled layer-by-layer process based on self-limiting gas-solid reactions. Thin films are prepared using volatile precursors in repeating cycles until a preferred film thickness is obtained. ALD is suited

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=355e65625b88::163174c306a39f3545c3497c3f86f082
https://cris.vtt.fi/en/publications/ccf7807f-c725-43c2-8e6c-dd5270172391

ALD/MLD deposited hybrid of DL-lactic acid and trimethylaluminium

Autor: Vähä-Nissi, Mika, Sievänen, Jenni, Salo, Erkki, Johansson, L.-S., Kenttä, Eija, Putkonen, Matti, Harlin, Ali

Publikováno v: Vähä-Nissi, M, Sievänen, J, Salo, E, Johansson, L-S, Kenttä, E, Putkonen, M & Harlin, A 2013, ' ALD/MLD deposited hybrid of DL-lactic acid and trimethylaluminium ', 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, United States, 28/07/13-31/07/13 .

Atomic and molecular layer deposition techniques have been successfully combined to produce inorganic-organic hybrid films with properties derived from both the inorganic and organic components. There are few reports dealing with further converting o

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=355e65625b88::ed7436233cc82943c94228b4d5eaefa4
https://cris.vtt.fi/en/publications/5bc4a09a-7001-4fec-a091-9c9dd7ec187e