Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Saksatha Ly"'
Publikováno v:
Advances in Patterning Materials and Processes XXXV.
Metal ions in photoresists and solvents pose an ever greater contamination problem in photolithography’s advanced applications. The reduction of metal contaminants is critical in the entire photochemical supply chain. In this paper we demonstrate t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8dd24a721a7dac563d117bb3fe4a0673
https://doi.org/10.1117/12.2297395
https://doi.org/10.1117/12.2297395
Publikováno v:
SPIE Proceedings.
Weak-polar solvents like PGMEA (Propylene Glycol Monomethyl Ether Acetate) or CHN (Cyclohexanone) are used to dissolve hydrophobic photo-resist polymers, which are challenging for traditional cleaning methods such as distillation, ion-exchange resins
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f01f4839ebb0daf022f98e2dabeffd37
https://doi.org/10.1117/12.2257388
https://doi.org/10.1117/12.2257388
Publikováno v:
Proceedings of SPIE; 1/14/2018, Vol. 10586, p1-11, 11p