Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Sakon Sansongsiri"'
Autor:
Somchai Thongtem, Wonchai Promnopas, Orawan Wiranwetchayan, Sakon Sansongsiri, Taweesak Kaewmanee, Titipun Thongtem, Surangkana Wannapop, Anukorn Phuruangrat
Publikováno v:
Inorganic Chemistry Communications. 103:87-92
One step hydrothermal synthesis of Mn-Zn ferrite was processed using different contents of ionic manganese, ionic zinc and oleic acid as an anti-agglomeration. In this research, magnetic nanoparticles are soft agglomeration and narrow size distributi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ee527e70977e88028e767585efffab0
https://doi.org/10.1016/j.inoche.2019.03.016
https://doi.org/10.1016/j.inoche.2019.03.016
Publikováno v:
Surface and Coatings Technology. 306:257-261
TiO 2 blocking layers were deposited on commercial fluorine-doped tin oxide (FTO) glasses by cathodic vacuum arc technique for using as working electrodes of dye-sensitized solar cells (DSSCs). These blocking layers were produced between FTO and meso
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::23d7e3b7faf639d0f88a2654ce9ae494
https://doi.org/10.1016/j.surfcoat.2016.06.032
https://doi.org/10.1016/j.surfcoat.2016.06.032
Publikováno v:
Surface and Coatings Technology. 229:36-41
A cathodic vacuum arc plasma (CVAP) system was constructed at Chiang Mai University to be used for the deposition of nanostructured and nanocomposite thin films. Various CVAP sources were developed, such as with a single or dual-rod cathode. A range
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e43c4ca8fca0576bcbc155149bbada62
https://doi.org/10.1016/j.surfcoat.2012.06.051
https://doi.org/10.1016/j.surfcoat.2012.06.051
Publikováno v:
Diamond and Related Materials. 17:2080-2083
Molybdenum-containing amorphous carbon (a-C:Mo) thin films were prepared using a dual-cathode filtered cathodic arc plasma source with a molybdenum and a carbon (graphite) cathode. The Mo content in the films was controlled by varying the deposition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::222ae1ff8f9b4d01131c273920f61a44
https://doi.org/10.1016/j.diamond.2008.07.006
https://doi.org/10.1016/j.diamond.2008.07.006
Publikováno v:
Pasaja, Nitisak; Sansongsiri, Sakon; Anders, Andre; Vilaithong, Thiraphat; & Intasiri, Sawate. (2006). Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/09x7w4td
Pasaja, Nitisak; Sansongsiri, Sakon; Intasiri, Sawate; Vilaithong, Thiraphat; & Anders, Andre. (2007). Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/764016vk
Pasaja, Nitisak; Sansongsiri, Sakon; Intasiri, Sawate; Vilaithong, Thiraphat; & Anders, Andre. (2007). Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage. Lawrence Berkeley National Laboratory. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/764016vk
Metal-containing tetrahedral amorphous carbon films were produced by dual filtered cathodic vacuum arc plasma sources operated in sequentially pulsed mode. Negatively pulsed bias was applied to the substrate when carbon plasma was generated, whereas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2d25cd8273fa134b24726d97e7070d57
https://doi.org/10.1016/j.nimb.2007.02.093
https://doi.org/10.1016/j.nimb.2007.02.093
Publikováno v:
The Review of scientific instruments. 78(6)
A dual-cathode arc plasma source was combined with a computer-controlled bias amplifier to synchronize substrate bias with the pulsed production of plasma. In this way, bias can be applied in a material-selective way. The principle has been applied t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3c3fab868590925bbd79e8b727882dc7
https://pubmed.ncbi.nlm.nih.gov/17614620
https://pubmed.ncbi.nlm.nih.gov/17614620