Zobrazeno 1 - 10
of 152
pro vyhledávání: '"Sakidja, Ridwan"'
Publikováno v:
In Computational Materials Science October 2024 245
Publikováno v:
In Computer Physics Communications December 2023 293
Publikováno v:
In Corrosion Science January 2023 210 Part 1
Autor:
Wilt, Jamie, Gong, Youpin, Gong, Ming, Su, Feifan, Xu, Huikai, Sakidja, Ridwan, Elliot, Alan, Lu, Rongtao, Zhao, Shiping, Han, Siyuan, Wu, Judy
Publikováno v:
Phys. Rev. Applied 7, 064022 (2017)
Metal-Insulator-Metal tunnel junctions (MIMTJ) are common throughout the microelectronics industry. The industry standard AlOx tunnel barrier, formed through oxygen diffusion into an Al wetting layer, is plagued by internal defects and pinholes which
Externí odkaz:
http://arxiv.org/abs/1701.08143
Publikováno v:
Journal of Functional Biomaterials; Oct2024, Vol. 15 Issue 10, p305, 18p
Publikováno v:
In Journal of Non-Crystalline Solids 15 February 2020 530
Autor:
Elliot, Alan J., Ma, Chunrui, Lu, Rongtao, Xin, Melisa, Han, Siyuan, Wu, Judy Z., Sakidja, Ridwan, Yu, Haifeng
Atomic Layer Deposition (ALD) is a promising technique for producing Josephson junctions (JJs) with lower defect densities for qubit applications. A key problem with using ALD for JJs is the interfacial layer (IL) that develops underneath the tunnel
Externí odkaz:
http://arxiv.org/abs/1408.3077
Akademický článek
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Autor:
Sakidja, Ridwan.
Thesis (Ph. D.)--University of Wisconsin--Madison, 2003.
eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (p. 104-108).
eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (p. 104-108).
Externí odkaz:
http://catalog.hathitrust.org/api/volumes/oclc/54072031.html
Autor:
Kizzire, Dayton G., Dey, Sonal, Mayanovic, Robert A., Sakidja, Ridwan, Landskron, Kai, Mandal, Manik, Wang, Zhongwu, Benamara, Mourad
Publikováno v:
In Microporous and Mesoporous Materials 1 November 2017 252:69-78