Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Sadayuki Ohnishi"'
Autor:
Hiroyasu Minda, Michio Sakurai, Sadayuki Ohnishi, Hideo Sakamoto, Noriaki Oda, Kenta Yamada, Norio Okada, Manabu Iguchi, Hiroshi Kitahara, Makoto Yasuda, Toshiyuki Takewaki, Masayuki Hiroi, Yoshihiko Asai, M. Suzuki
Publikováno v:
IEICE Transactions on Electronics. :968-977
This paper proposes an accurate modeling method of the copper interconnect cross-section in which the width and thickness dependence on layout patterns and density caused by processes (CMP, etching, sputtering, lithography, and so on) are fully, inco
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54a4aba4c31095d4edb34ea17f2f5fd5
https://doi.org/10.1093/ietele/e91-c.6.968
https://doi.org/10.1093/ietele/e91-c.6.968
Autor:
Noriaki Oda, Sadayuki Ohnishi, Kenta Yamada, Kazuyoshi Ueno, Y. Kakuhara, Masayoshi Tagami, Shuji Sone, Hiroyuki Kunishima, Yoshihiro Hayashi, Hironori Imura, M. Sekine, Naoyoshi Kawahara
Publikováno v:
IEICE Transactions on Electronics. :848-855
A novel interconnect design concept named "ASIS (Appilication-specific Interconnect Structure)" is presented for 45 nm CMOS performance maximization. Basic scheme of ASIS is that corresponding to applications, such as high-performance, low-power, or
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a289d5e5d9d207328955c1f3ec8bc99d
https://doi.org/10.1093/ietele/e90-c.4.848
https://doi.org/10.1093/ietele/e90-c.4.848
Autor:
Kenta Yamada, M. Sekine, Noriaki Oda, Naoyoshi Kawahara, H. Imura, Y. Kakuhara, Kazuyoshi Ueno, Hiroyuki Kunishima, Sadayuki Ohnishi, M. Tagami, Yoshihiro Hayashi, S. Sone
Publikováno v:
IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..
A novel interconnect design concept named "ASIS (application-specific interconnect structure)" is presented for 45 nm CMOS performance maximization. Basic scheme of ASIS is that corresponding to applications, such as high-performance, low-power or hi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f64acd895cc8cdefbace582d1fa4f36c
https://doi.org/10.1109/iedm.2005.1609538
https://doi.org/10.1109/iedm.2005.1609538
Publikováno v:
IEEE Transactions on Electron Devices; July97, Vol. 44 Issue 7, p1076, 8p, 2 Black and White Photographs, 2 Diagrams, 6 Graphs
Publikováno v:
IEEE Transactions on Electron Devices; 1995, Vol. 42 Issue 7, p1247-1254, 8p
Publikováno v:
Symposium 1993 on VLSI Technology; 1993, p17-18, 2p
Autor:
Jennifer L. Carr
This book represents the tenth edition of what has become an established reference work, MAJOR COMPANIES OF THE Guide to the FAR EAST & AUSTRALASIA This volume has been carefully researched and updated since publication of the prevIous arrangement of
