Zobrazeno 1 - 3
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pro vyhledávání: '"Sadao Okano"'
Autor:
Kazuya Kadota, Sadao Okano, Masayasu Tsunematsu, Kazuyuki Suko, Masahiro Nozaki, Sugimoto Aritoshi, Takeshi Kato, Tetsuo Ito
Publikováno v:
Optical/Laser Microlithography III.
New indexes to evaluate and simulate the resolution power of the UV resists based on the dissolution rate curve as it relates to local inhibitor concentration are proposed. Optical parameters and the dissolution rate curve of commercially available r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac4b11675dd3d11a3dcd44d386194c50
https://doi.org/10.1117/12.20218
https://doi.org/10.1117/12.20218
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 9:2792
The photoactive and development parameters of commercially available g‐line photoresists which are TOKs OFPR800, OFPR5000, TSMR8900, and TSMR‐V3, were measured. From the simulated and experimental linewidth linearity data, it was found that the p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::84916929c1d9846be7792a39a8e45d7f
https://doi.org/10.1116/1.585646
https://doi.org/10.1116/1.585646
Conference
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