Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Sabera Fahmida Shiba"'
Publikováno v:
Micro and Nano Systems Letters, Vol 8, Iss 1, Pp 1-12 (2020)
Abstract This paper presents a computer-controlled multidirectional UV-LED lithography system for 3-D microfabrication. The presented UV-LED system has adopted adjustable or programmable high-intensity UV-LEDs as a light source enabling for photopatt
Externí odkaz:
https://doaj.org/article/644cf61d752e4490a6b2ff7777f6bfc6
Publikováno v:
Micromachines, Vol 11, Iss 2, p 157 (2020)
This paper demonstrates a 3D microlithography system where an array of 5 mm Ultra Violet-Light Emitting Diode (UV-LED) acts as a light source. The unit of the light source is a UV-LED, which comes with a length of about 8.9 mm and a diameter of 5 mm.
Externí odkaz:
https://doaj.org/article/073d236bb8e94dcab7375b615329a11a
Publikováno v:
Journal of Microelectromechanical Systems. 31:97-105
Publikováno v:
Micro and Nano Systems Letters, Vol 8, Iss 1, Pp 1-12 (2020)
This paper presents a computer-controlled multidirectional UV-LED lithography system for 3-D microfabrication. The presented UV-LED system has adopted adjustable or programmable high-intensity UV-LEDs as a light source enabling for photopatterning bo
Publikováno v:
2021 21st International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers).
This paper presents frequency-selective 3D vertical pillars arrays that have been tuned to 15 GHz as a center frequency of the Ku-Band (12-18 GHz) for satellite applications. The vertical pillars were designed with a quarter wavelength height and a h
Publikováno v:
2021 21st International Conference on Solid-State Sensors, Actuators and Microsystems (Transducers).
This paper presents a tiltable UV-LED lithography system for 3D microfabrication. Collimated light with adjustable intensity from 7-by-7 405-nm UV-LEDs was used as a light source. An orbital rotation of the UV-LED array provided the uniform light int
Autor:
Jungkwun lJK' Kim, James Brovles, Diego Laramore, Tyler J. Hieber, Bo Lindstrom, Corey Gaither, Jace Beavers, Sabera Fahmida Shiba
Publikováno v:
NEMS
This paper presents a design, system setup, characterization, and microfabrication of high-intensity UV-LED microlithography. Since the high enough intensity of the UV light enables even a millimeter thick SU-8 photoresist process, an array of high-i