Zobrazeno 1 - 10
of 82
pro vyhledávání: '"SYSTEM INTEGRATOR"'
Autor:
Sun, Yaowu, Gong, Xiaoye
Publikováno v:
Journal of Manufacturing Technology Management, 2020, Vol. 31, Issue 7, pp. 1457-1480.
Externí odkaz:
http://www.emeraldinsight.com/doi/10.1108/JMTM-07-2019-0269
Autor:
VanDoren, Vance
Publikováno v:
Control Engineering. May2001, Vol. 48 Issue 5, p44. 5p. 1 Color Photograph.
Akademický článek
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Autor:
Taji, Noriko, Enami, Tatsuo
Publikováno v:
法政大学イノベーション・マネジメント研究センター ワーキングペーパーシリーズ. 251:1-21
In the semiconductor industry, photolithography equipment is used to expose patterns on wafers to be manufactured into semiconductor chips. This equipment consists of extremely complex, large-scale industrial machines containing many high-technology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=jairo_______::56972668bfe1f4b05471713c26e138ba
http://hdl.handle.net/10114/00026684
http://hdl.handle.net/10114/00026684
Publikováno v:
Journal of Sustainable Development. 7(17):149-174
Externí odkaz:
https://www.ceeol.com/search/article-detail?id=564565
Autor:
Banta, Lisa M.
In 2008, Congress passed Public Law 110-181, which directed the Secretary of Defense to properly size and train the Department of Defense workforce to do more inherently governmental functions. There was no training path established to support this l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______2778::dd7b77bdf6a7f7ba48313f92cb007e21
https://hdl.handle.net/10945/72012
https://hdl.handle.net/10945/72012
Publikováno v:
Emerald Emerging Markets Case Studies, 2015, Vol. 5, Issue 7, pp. 1-10.
Externí odkaz:
http://www.emeraldinsight.com/doi/10.1108/EEMCS-03-2014-0065
Autor:
Beelaerts van Blokland, W.W.A., Fiksiński, M.A., Amoa, S.O.B., Santema, S.C., van Silfhout, G.‐J., Maaskant, L.
Publikováno v:
International Journal of Operations & Production Management, 2012, Vol. 32, Issue 8, pp. 982-1007.
Externí odkaz:
http://www.emeraldinsight.com/doi/10.1108/01443571211253155
Autor:
Beelaerts van Blokland, Wouter W.A., Santema, Sicco C., Heene, Aimé, de Jong, Tim, Elferink, Niek
Publikováno v:
A Focused Issue on Competence Perspectives on New Industry Dynamics