Zobrazeno 1 - 10
of 110
pro vyhledávání: '"SUSUMU IIDA"'
Publikováno v:
Physiological Reports, Vol 10, Iss 8, Pp n/a-n/a (2022)
Abstract The incidence of aortic stenosis (AS) increases with age and is a serious problem in an aging society. In recent years, transcatheter aortic valve implantation (TAVI) has been performed widely; however, older patients may be ineligible for T
Externí odkaz:
https://doaj.org/article/22fc1d1eca974c8d85133db07ba71a63
Autor:
Susumu Iida, Takayuki Uchiyama
Publikováno v:
Micro and Nano Engineering, Vol 3, Iss , Pp 44-49 (2019)
Standard samples with programmed micro-defects were fabricated for evaluating the defect detection capability of the next generation of pattern inspection tools. A 1.5-nm protrusion programmed defect and a 4-nm-wide (
Externí odkaz:
https://doaj.org/article/3ecf2c348767449fbb54ccb41ad1d195
Publikováno v:
Physiological Reports, Vol 9, Iss 5, Pp n/a-n/a (2021)
Abstract Background The Borg scale is used to determine exercise intensity in rehabilitation but can be difficult for older adults to understand. By contrast, face scale that are used to evaluate pain are much easier to understand thanks to the inclu
Externí odkaz:
https://doaj.org/article/887b52e0bd074f979635d39d86108d49
Publikováno v:
Journal of the Atomic Energy Society of Japan. 63:50-54
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d4960bc39b11699c0fc0d2e9f104ae89
https://doi.org/10.3327/jaesjb.63.1_50
https://doi.org/10.3327/jaesjb.63.1_50
Autor:
Takayuki Uchiyama, Susumu Iida
Publikováno v:
Micro and Nano Engineering, Vol 3, Iss, Pp 44-49 (2019)
Standard samples with programmed micro-defects were fabricated for evaluating the defect detection capability of the next generation of pattern inspection tools. A 1.5-nm protrusion programmed defect and a 4-nm-wide (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::700aec207afb0da2a4d5c4812907c796
http://www.sciencedirect.com/science/article/pii/S2590007219300152
http://www.sciencedirect.com/science/article/pii/S2590007219300152
Autor:
Tadashi Narabayashi, Masanobu Kamiya, Katsuya Kuroiwa, Susumu Iida, Katsumi Ebisawa, Toshihiro Aida
Publikováno v:
Journal of the Atomic Energy Society of Japan. 59:530-534
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::166c6cca7aca16baf1c620e2e2ab9090
https://doi.org/10.3327/jaesjb.59.9_530
https://doi.org/10.3327/jaesjb.59.9_530
Autor:
Shunko Magoshi, Satoshi Tanaka, Susumu Iida, Takashi Kamo, Takayuki Uchiyama, Yasutaka Morikawa, Takeshi Yamane
Publikováno v:
Extreme Ultraviolet (EUV) Lithography X.
We report on the reduction of the mask 3D effect in an etched 40-pair multilayer extreme ultraviolet (EUV) lithography mask by measuring the printed ΔCD (horizontal–vertical) on exposure with a high-NA small field exposure tool (HSFET). We compare
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c087f180a3305c18a54f40ce7922141
https://doi.org/10.1117/12.2515273
https://doi.org/10.1117/12.2515273
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
Standard wafers with programmed defects (PDs) were fabricated to evaluate charge control techniques, resolution, and defect detection capabilities of pattern inspection tools for 7-nm and smaller nodes. To evaluate charge control techniques, the PDs
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d1d46b175f6bf736b5049a248ba80448
https://doi.org/10.1117/12.2514897
https://doi.org/10.1117/12.2514897
Publikováno v:
Applied Surface Science. 384:244-250
The effects of the presence of a native oxide film or surface contamination as well as variations in material density on the total electron yield (TEY) of Ru and B 4 C were assessed in the absence of any surface charging effect. The experimental resu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e69e4a1916913504aaf0b8457e6245e6
https://doi.org/10.1016/j.apsusc.2016.04.143
https://doi.org/10.1016/j.apsusc.2016.04.143
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 18:1
Background: Continued shrinkage of pattern size has caused difficulties in detecting small defects. Multibeam scanning electron microscopy (SEM) is a potential method for pattern inspection below 7-nm node. Performance of the tool depends on charge c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6057ae9fd0b2b91133718c4c1e8614c9
https://doi.org/10.1117/1.jmm.18.3.033503
https://doi.org/10.1117/1.jmm.18.3.033503