Zobrazeno 1 - 10
of 32
pro vyhledávání: '"SHUNGO SUGAWARA"'
Publikováno v:
Applied optics. 14(2)
The dye-sensitized photopolymerization of acrylamide was investigated in order to obtain new holographic recording media that have high diffraction efficiency and a long photosensitive life. The characteristics of the photosensitive system, containin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5d99b23f314d5666ca82ce5c244f6705
https://pubmed.ncbi.nlm.nih.gov/20134894
https://pubmed.ncbi.nlm.nih.gov/20134894
Autor:
Hirotsugu Sato, Shungo Sugawara
Publikováno v:
Japanese Journal of Applied Physics. 32:L799
High quality BaF2 (111) thin film was epitaxially grown on a CaF2 (111) substrate by chemical vapor deposition. An novel fluorinated Barium β-diketone chelate; Ba(ofhd)2 was used as the source material. Oxygen was introduced to complete the fluorina
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40f5eb49fe617e0f516fe694c80f75e6
https://doi.org/10.1143/jjap.32.l799
https://doi.org/10.1143/jjap.32.l799
Autor:
Kazuo Fujiura, Hirotsugu Sato, Yoshiki Nishida, Shiro Takahashi, Shungo Sugawara, Kenji Kobayashi
Publikováno v:
Japanese Journal of Applied Physics. 31:L1692
We have successfully synthesized NaF-containing ZrF4-based fluoride glass (ZrF4-BaF2-NaF) (ZrF4-BaF2-LaF3-AlF3-NaF) particles by the chemical vapor deposition (CVD) process. In this process, Na β-diketonate (Na(ppm)) was used for the Na source. Diff
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5cbc87673816e2702b1cea2588508016
https://doi.org/10.1143/jjap.31.l1692
https://doi.org/10.1143/jjap.31.l1692
Publikováno v:
Journal of Applied Polymer Science. 27:937-949
High sensitivity and high contrast electron negative resist, chloromethylated polystyrene (CMS) was developed for direct writing electron beam lithography with 1-μm resolution. The resist shows excellent lithographic performances such as high plasma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::791f2da71ceabee432b8d9c777e7a7ca
https://doi.org/10.1002/app.1982.070270313
https://doi.org/10.1002/app.1982.070270313
Publikováno v:
Journal of The Electrochemical Society. 129:1831-1835
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b709be9ea9122d71e8e39862eb416605
https://doi.org/10.1149/1.2124303
https://doi.org/10.1149/1.2124303
Publikováno v:
Polymer Journal. 18:227-235
Photo-induced wettability changes in polymer films containing spiropyrans with long alkyl chains are investigated as a function of alkyl chain length and spiropyran content. It was found that spiropyrans with longer alkyl chains easily crystallize in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44e91c0279ad6ca0fb282ca3d9e73fde
https://doi.org/10.1295/polymj.18.227
https://doi.org/10.1295/polymj.18.227
Publikováno v:
Journal of The Electrochemical Society. 131:1122-1129
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cf3850d2735e4fd7b55d1d33c9bc8fa2
https://doi.org/10.1149/1.2115763
https://doi.org/10.1149/1.2115763
Publikováno v:
Journal of The Electrochemical Society. 124:1648-1651
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8152e300315f9404ed6f0c87a1d6f809
https://doi.org/10.1149/1.2133127
https://doi.org/10.1149/1.2133127
Autor:
Nobuo Ishikawa, Shungo Sugawara
Publikováno v:
The Journal of the Society of Chemical Industry, Japan. 72:2425-2429
有用な耐熱性高分子用モノマーを探索する目的で,いくつかの含フッ素1,3-および1,4-フェニレンジアミン類を合成し,それらのアシル化合物の熱的性質をしらべた。2,6-ジフルオルアセトア
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2b3c5a8d982172e3b3f5ff304fa2fe7
https://doi.org/10.1246/nikkashi1898.72.11_2425
https://doi.org/10.1246/nikkashi1898.72.11_2425
Publikováno v:
The Journal of the Society of Chemical Industry, Japan. 71:519-522
5-フルオルイソフタル酸ジメチル[1]をイソフタル酸からつぎの経路によって合成した。イソフタル酸→5-ニトロソフタル酸→5-ニトロイソフタル酸ジメチル→5-アミノイソフタル酸ジメチ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22a1e4e89bb30edf700cfd092224d46f
https://doi.org/10.1246/nikkashi1898.71.4_519
https://doi.org/10.1246/nikkashi1898.71.4_519