Zobrazeno 1 - 10
of 60
pro vyhledávání: '"SABURO NONOGAKI"'
Autor:
Hajime Morishita, Masato Ito, Masahiro Nishizawa, Yoshiyuki Odaka, Nobuaki Hayashi, Saburo Nonogaki
Publikováno v:
Journal of Photopolymer Science and Technology. 7:59-66
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::057cb4017585a5befb6da889b85f4dfb
https://doi.org/10.2494/photopolymer.7.59
https://doi.org/10.2494/photopolymer.7.59
Autor:
Saburo Nonogaki, Minoru Toriumi
Publikováno v:
Makromolekulare Chemie. Macromolecular Symposia. 33:233-241
Phenolic resins such as cresol novolac and poly-(p-hydroxystyrene) are photosensitized by the addition of an aromatic azide to give negative-working photoresists. The spectral sensitivity can be varied from deep UV to visible region by changing the k
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b7e235a23d953dbe5ba8f9987fbe7cac
https://doi.org/10.1002/masy.19900330120
https://doi.org/10.1002/masy.19900330120
Autor:
Saburo Nonogaki
Publikováno v:
Journal of Photopolymer Science and Technology. 12:3-5
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::99f8dd4fc18816a94916a054528ef008
https://doi.org/10.2494/photopolymer.12.3
https://doi.org/10.2494/photopolymer.12.3
Autor:
Saburo Nonogaki
Publikováno v:
Optical Review. 13:46-47
Intensity distribution of transverse electric (TE) wave diffracted by a perfectly black half plane or an infinite slit opened in a perfectly black plane is calculated precisely. In the case of diffraction by a half plane, the intensity distribution h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0bbbb2e44c75108e1f02a322c5a57e86
https://doi.org/10.1007/s10043-006-0046-1
https://doi.org/10.1007/s10043-006-0046-1
Autor:
Saburo Nonogaki
Publikováno v:
Kobunshi. 44:219-219
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e224bf33675336e6688b557afb5f81b9
https://doi.org/10.1295/kobunshi.44.219
https://doi.org/10.1295/kobunshi.44.219
Autor:
Akira Imai, Saburo Nonogaki
Publikováno v:
Japanese Journal of Applied Physics. 32:4845
A simple method to fabricate fine lines of photoresist has been developed. The method utilizes a mask containing an equal-width line-and-space pattern of the half-wavelength phase shifter. A film of photoresist formed on a substrate is placed in clos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d423c009563de72b72dc90416523d38
https://doi.org/10.1143/jjap.32.4845
https://doi.org/10.1143/jjap.32.4845
Autor:
Michiaki Hashimoto, Minoru Toriumi, Takao Iwayanagi, Takumi Ueno, Nobuaki Hayashi, Saburo Nonogaki
Publikováno v:
Polymer Engineering and Science. 29:868-873
The design and preparation of a series of negative resists for KrF excimer laser lithography are described. Each resist is composed of poly(hydroxystyrene) and an aromatic azide. The base resin shows high transmittance of 62%/μm at 248 nm, when p-et
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b74232f1a000dc1649237c175a044b62
https://doi.org/10.1002/pen.760291308
https://doi.org/10.1002/pen.760291308