Zobrazeno 1 - 10
of 59
pro vyhledávání: '"S.P. Vernon"'
Autor:
H.F. Robey, Robert Berger, F.A. Weber, Michael Rose, Robert K. Reich, R. A. Murphy, S.P. Vernon, D.D. Rathman, Brian Tyrrell, A.M. Soares, T. Perry, David M. Craig, E. J. Kohler
Publikováno v:
IEEE Journal of Solid-State Circuits. 43:1940-1950
A 64 times 64-pixel test circuit was designed and fabricated in 0.18-mum CMOS technology for investigating high-speed imaging with large-format imagers. Several features are integrated into the circuit architecture to achieve fast exposure times with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::18b566c60045dfb445e85d1083ccdd01
https://doi.org/10.1109/jssc.2008.2001912
https://doi.org/10.1109/jssc.2008.2001912
Publikováno v:
IEEE Transactions on Magnetics. 34:915-917
In this paper, we present results of a study on Ni/sub 81/Fe/sub 19/Cu MLs deposited using a four-source DC magnetron sputtering system operated in planetary mode. A significant change of GMR value with deposition conditions, especially base pressure
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b1a250237f97358c1c5c79a3310e7d3
https://doi.org/10.1109/20.706310
https://doi.org/10.1109/20.706310
Publikováno v:
1997 IEEE International Magnetics Conference (INTERMAG'97).
We present results of a study on optimization of the magnetoresistance (GMR) response in Co/Cu multilayers (MLs) for Cu layer thickness near the second oscillatory peak. Co/Cu MLs with alternating thick (t/sup (1)//sub Co/) and thin (t/sup (2)//sub C
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f4caaa42534c2f227b9c0740f8bd2276
https://doi.org/10.1109/intmag.1997.597485
https://doi.org/10.1109/intmag.1997.597485
Autor:
D. O'Kane, Z.C.H. Tan, D. Kroes, B. Law, J.P. Spallas, M. Thomas, D. R. Kania, S.P. Vernon, Y. Huai, B. Fuchs
Publikováno v:
IEEE Transactions on Magnetics. 32:4710-4712
We have fabricated a novel giant magnetoresistive (GMR) multilayer (ML) flux sensor that is designed to operate in the current perpendicular to the plane (CPP) mode. The CPP-GMR sensor is a 0.4 /spl mu/m diameter, 0.09 /spl mu/m tall Co-Cu ML pedesta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::08b043865b977e1c9f9ab80104e79741
https://doi.org/10.1109/20.539126
https://doi.org/10.1109/20.539126
Publikováno v:
IEEE Transactions on Magnetics. 32:4472-4474
We have fabricated arrays of Co dots having diameters of 100 nm and 70 nm using interference lithography. The density of these arrays is 7.2/spl times/10/sup 9//in/sup 2/. Magnetic force microscopy measurements indicate that the Co dots are single-do
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44c39adf9e32e1d5bf19f26fafe9a491
https://doi.org/10.1109/20.538901
https://doi.org/10.1109/20.538901
Autor:
D.W. Sweeney, S.P. Vernon, K.W. DeLong, D.A. Tichenor, S.L. Baker, R. N. Kestner, D.P. Gaines
The surface topography of optics fabricated for Extreme Ultraviolet Lithography has been measured using a combination of phase-measuring interferometery and atomic force microscopy. Power Spectral Densities were computed over spatial frequencies exte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1b58e525c7e89580a5e85ae040ba975f
https://doi.org/10.2172/378184
https://doi.org/10.2172/378184
Autor:
S.P. Vernon, D.R. Kania, P.A. Kearney, R.A. Levesque, A.V. Hayes, B. Druz, E. Osten, R. Rajan, H. Hedge
Publikováno v:
Extreme Ultraviolet Lithography (TOPS).
We report on the growth of low defect density Mo/Si multilayer (ML) coatings. The coatings were grown in a deposition system specifically designed for EUVL reticle blank fabrication. Complete, 81 layer, high reflectance Mo/Si ML coatings were deposit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bcffc7fa7d167790b33ae9aad00f89ff
https://doi.org/10.1364/eul.1996.r44
https://doi.org/10.1364/eul.1996.r44
Publikováno v:
Extreme Ultraviolet Lithography (TOPS).
We report progress in the aspherization of precision optical substrates via deposition of graded period Mo/Si multilayer coatings using a masking technique. These preliminary results show good agreement between the measured and desired thickness prof
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::baf1a89577286d9897fc41de7489a28d
https://doi.org/10.1364/eul.1996.dfo156
https://doi.org/10.1364/eul.1996.dfo156
Autor:
D. P. Gaines, K.W. DeLong, S.P. Vernon, D.G. Stearns, D.W. Sweeney, S.L. Baker, D. A. Tichenor, R. Kestner
Publikováno v:
Optical Fabrication and Testing.
The surface topography of optics for extreme ultraviolet lithography (EUVL) must be precisely controlled from spatial scales extending from the full aperture (~50mm) to the wavelength of illumination (~13nm), or 7 orders of magnitude. Measurement and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2f8beefc311705d64cdacacf4d71beb
https://doi.org/10.1364/oft.1996.jthb.3
https://doi.org/10.1364/oft.1996.jthb.3