Zobrazeno 1 - 10
of 311
pro vyhledávání: '"S.P. Fu"'
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Autor:
Liu, Bin1 (AUTHOR) 20233058@stu.sxau.edu.cn, Wu, Yixuan2 (AUTHOR) dwu4008@163.com, Xing, Zebing1 (AUTHOR) xingzb92@sxau.edu.cn, Zhang, Ji1 (AUTHOR) 18235488991@163.com, Xue, Yuxin1 (AUTHOR)
Publikováno v:
Molecules. Nov2024, Vol. 29 Issue 21, p5213. 16p.
Autor:
Jiménez-Jiménez, Félix Javier1 (AUTHOR) fjavier.jimenez@salud.madrid.org, Alonso-Navarro, Hortensia1 (AUTHOR) paula.salgado@salud.madrid.org, Salgado-Cámara, Paula1 (AUTHOR), García-Martín, Elena2 (AUTHOR) elenag@unex.es, Agúndez, José A. G.2 (AUTHOR) jagundez@unex.es
Publikováno v:
Biomolecules (2218-273X). Oct2024, Vol. 14 Issue 10, p1266. 48p.
Publikováno v:
Solid State Communications. 137:203-207
We report an investigation of the recombination mechanism for photoluminescence (PL) in InN epilayers grown by molecular beam epitaxy and metal-organic chemical vapor deposition with a wide range of free electron concentrations from 3.5×10 17 –5×
Autor:
Wang, Ziyu1,2 (AUTHOR) 211902331@stu.yzu.edu.cn, Gong, Wei1,2 (AUTHOR) mx120220894@stu.yzu.edu.cn, Yao, Zeling1,2 (AUTHOR) 211603122@stu.yzu.edu.cn, Jin, Kai1,2 (AUTHOR) 007838@yzu.edu.cn, Niu, Yingjie1,2 (AUTHOR) niuyj@yzu.edu.cn, Li, Bichun1,2 (AUTHOR) yubcli@yzu.edu.cn, Zuo, Qisheng1,2 (AUTHOR) 006664@yzu.edu.cn
Publikováno v:
Animals (2076-2615). Jun2024, Vol. 14 Issue 12, p1742. 15p.
Autor:
W. Chang, P.W. Wang, Ming-Ta Lei, K. Goto, H.C. Hsieh, C.H. Diaz, W.Y. Lien, S.C. Wang, H.Y. Huang, Hun-Jan Tao, Y.H. Chang, C.H. Yeh, L.T. Lin, D.Y. Lee, C.C. Wu, S.P. Fu, Y.H. Chiu, J.H. Chen, M.H. Hsieh, Y.P. Wang, C.T. Lin, Che-Min Chu, H.H. Lin, S.Y. Lu, Y.J. Mii, S.J. Yang, Chun-Kuang Chen, C.F. Nieh, Y.Y. Tarng, Kuan-Lun Cheng, M. Cao, Chii-Ming Wu, H.C. Tuan, D.W. Lin, M.J. Huang, F.C. Chen, C.M. Liu, M.Y. Wang
Publikováno v:
2007 IEEE International Electron Devices Meeting.
A highly scaled, high performance 45 nm CMOS technology utilizing extensive immersion lithography to achieve the industry's highest scaling factor with ELK (k=2.55) BEOL is presented. A record gate density 2.4X higher than that of 65 nm is achieved.
Autor:
He, Jinchao1 (AUTHOR) hejinchao@stu.ouc.edu.cn, Xu, Yongsheng1,2,3,4 (AUTHOR) jiangqiufu@qdio.ac.cn, Sun, Hanwei5 (AUTHOR) sunhw12@tsinghua.org.cn, Jiang, Qiufu1 (AUTHOR), Yang, Lei6 (AUTHOR) leiyang@fio.org.cn, Kong, Weiya5 (AUTHOR) kongweiya@buaa.edu.cn, Liu, Yalong7 (AUTHOR) liuyalong@ncs.mnr.gov.cn
Publikováno v:
Remote Sensing. Apr2024, Vol. 16 Issue 8, p1359. 13p.
Autor:
Shamsher, Ehtesham1,2 (AUTHOR) ehtesham.shamsher.16@alumni.ucl.ac.uk, Khan, Reas S.3 (AUTHOR) kdine@pennmedicine.upenn.edu, Davis, Benjamin M.1 (AUTHOR), Dine, Kimberly3 (AUTHOR), Luong, Vy1 (AUTHOR), Cordeiro, M. Francesca1,4,5 (AUTHOR) m.cordeiro@ucl.ac.uk, Shindler, Kenneth S.3 (AUTHOR) m.cordeiro@ucl.ac.uk
Publikováno v:
International Journal of Molecular Sciences. Apr2024, Vol. 25 Issue 7, p4047. 12p.
Autor:
Soares, Érica Novaes1 (AUTHOR), Costa, Ana Carla dos Santos1 (AUTHOR), Ferrolho, Gabriel de Jesus1,2 (AUTHOR), Ureshino, Rodrigo Portes3,4 (AUTHOR), Getachew, Bruk5 (AUTHOR), Costa, Silvia Lima1 (AUTHOR), da Silva, Victor Diogenes Amaral1,2 (AUTHOR) vdsilva@ufba.br, Tizabi, Yousef5 (AUTHOR) vdsilva@ufba.br
Publikováno v:
Cells (2073-4409). Mar2024, Vol. 13 Issue 6, p474. 23p.
Autor:
Park, Jongsoo1 (AUTHOR) jongsoo8393@naver.com, Kim, Changwoon2 (AUTHOR) imkcw1127@gmail.com, Jang, Jong Geol2 (AUTHOR) jonggirl83@naver.com, Lee, Seok Soo3 (AUTHOR) andrea0710@naver.com, Hong, Kyung Soo2 (AUTHOR) number111q@naver.com, Ahn, June Hong2 (AUTHOR) number111q@naver.com
Publikováno v:
Cancers. Mar2024, Vol. 16 Issue 6, p1203. 10p.