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Magnetic property improvement of melt spun LaCo5-based nanocomposites with Y, Fe and C substitutions
Publikováno v:
Journal of Alloys and Compounds. 821:153271
Magnetic properties, crystal structure, and microstructure of La1-xYxCo4.7-yFeyC0.3 alloys (x = 0–1; y = 0–0.5) prepared by melt spinning are reported. Very low coercivity (iHc) of 0.2 kOe is found for LaCo4.7C0.3 ribbon due to the existence of l
Publikováno v:
Journal of Power Sources. 196:126-132
In the present study, the Nafion ® -based self-humidifying composite membrane (N-SHCM) with sulfonated carbon nanofiber-supported Pt ( s -Pt/CNF) catalyst, N- s -Pt/CNF, is successfully prepared using the solution-casting method. The scanning electr
Publikováno v:
Journal of Hazardous Materials. 58:221-226
In the TGA experiments, the activation energy (25–30 kcal mol −1 ) and preexponential constant (ln A =34.6 h −1 ) of the pyrolysis of PU/CFCs wastes were obtained. At least three discrete features at 328, 423, and 443 K are observed correspondi
Publikováno v:
Scripta Materialia. 36:1227-1232
Based on the analysis of Bauschinger effects in MA Al-Ti alloys, it showed that the matrix mean stress developed rapidly at small plastic strains, which might account for the rather high initial strain-hardening rate usually observed in MA alloys. Th
Autor:
Hun-Jan Tao, H. C. Lin, Huan-Just Lin, Lee Chia-Fu, P.C. Yen, C.H. Huang, Yuan-Hung Chiu, W.S. Huang, C. C. Wu, King-Yuen Wong, Chun Chen, Stock Chang, Wang Shiang-Bau, Li-Shiun Chen, S.W. Chuang, Po-Kang Wang, Ming-Jie Huang, X.F. Yu, S.Y. Ku, Chien-Chao Huang, M.L. Cheng, Yung-Huei Lee, K. F. Yu, T.H. Li, C.M. Wu, Y. C. Peng, C.H. Tsai, Y.C. Lin, Tsz-Mei Kwok, Yi-Chun Huang, P.S. Lim, T.C. Gan, Tzong-Lin Wu, K.Y. Hsu, L.Y. Yang, S.S. Lin, L.W. Weng, T.H. Hsieh, F.K. Yang, C.T. Chan, Eric Ou-Yang, P.C. Hsieh, Derek Lin, S.B. Wang, Ming-Jer Chen, A. Keshavarzi, Chih-Yuan Lu, Chuan-Ping Hou, L.T. Lin, J.L. Yang, Yuh-Jier Mii, Chien-Chang Su, J.H. Chen, Hsieh Ching-Hua, Huan-Neng Chen, Y.W. Tseng, C. P. Lin, Chou Chun-Hao, A.S. Chang, Tseng Chien-Hsien, S.H. Liao, Tsung-Lin Lee, M. Cao
Publikováno v:
2010 International Electron Devices Meeting.
A high performance 22/20nm CMOS bulk FinFET achieves the best in-class N/P I on values of 1200/1100 µA/µm for I off =100nA/µm at 1V. Excellent device electrostatic control is demonstrated for gate length (L gate ) down to 20nm. Dual-Epitaxy and mu
Publikováno v:
IEEE Transactions on Magnetics. 35:2595-2597
Two kinds of abutted junction magnetoresistive recording heads with different SAL effective magnetic anisotropy were manufactured. Experimental results show that heads with near zero magnetostriction have stable performance. However, heads with very
Autor:
S.H. Liao
Publikováno v:
IEEE Transactions on Magnetics. 26:328-332
Electrodeposition processes have been extensively used in thin-film head fabrication. Extremely fine features can be produced using photolithographic pattern definition followed by electroplating. Permalloy has been exclusively used for the pole mate
Publikováno v:
2006 International SiGe Technology and Device Meeting.
Publikováno v:
2006 International SiGe Technology and Device Meeting.