Zobrazeno 1 - 10
of 103
pro vyhledávání: '"S.E. Rock"'
Publikováno v:
Journal of The Electrochemical Society. 163:A2282-A2292
Publikováno v:
Measurement. 53:71-82
Charge recombination at the electrolyte–photoanode interface of a dye sensitized solar cell (DSSC) is a major efficiency-limiting factor of the cell. To mitigate this recombination effect it is necessary to ensure that the effective electron lifeti
Publikováno v:
Current Applied Physics. 13:2087-2097
The diode ideality factor ( m ) and the series resistance ( R s ) of a Si solar cell represent two critical performance-indicator parameters of the device. Since both m and R s are functions of voltage ( V ) and temperature ( T ), simultaneous electr
Publikováno v:
ACS Applied Materials & Interfaces. 5:2075-2084
Nonvolatile and nonflammable ionic liquids (ILs) have distinct thermal advantages over the traditional organic solvent electrolytes of lithium ion batteries. However, this beneficial feature of ILs is often counterbalanced by their high viscosity (a
Publikováno v:
ECS Journal of Solid State Science and Technology. 2:P205-P213
Chemical mechanical planarization (CMP) of Ru barrier lines is expected to become a critical processing step in the fabrication of the new interconnect-structures. However, due to its noble metal characteristics, Ru induces galvanic corrosion in its
Publikováno v:
Industrial & Engineering Chemistry Research. 51:14084-14098
We investigated the thermophysical and electrochemical properties of eight model protic ionic liquids (PILs) primarily because of our interest in their proton conductivity and low volatility. The chemical structures of the cations (ammonium vs imidaz
Publikováno v:
Materials Chemistry and Physics. 136:1027-1037
In the fabrication of integrated circuits, certain steps of materials processing involve chemical mechanical planarization (CMP) of Al deposited on thin layers of diffusion barrier materials like Ta/TaN, Co, or Ti/TiN. A specific example of this situ
Publikováno v:
Anal. Methods. 4:106-117
Electrochemical and photo-electrochemical systems, often involving solid-liquid interfaces, have traditionally dominated the field of material/device characterization using electro-analytical tools such as linear sweep voltammetry (LSV) and impedance
Publikováno v:
Thin Solid Films. 520:2892-2900
Chemical mechanical planarization (CMP) of tantalum nitride is an essential step of material processing in the fabrication of integrated circuits. This CMP step often involves the chemical formation of a structurally weak oxide-complex film on the wa
Publikováno v:
Materials Chemistry and Physics. 129:1159-1170
The fabrication of interconnect structures for semiconductor devices requires low down-pressure chemical mechanical planarization (CMP) of Ta barrier layers. Guanidine carbonate (GC) serves as an effective surface-complexing agent for such CMP applic