Zobrazeno 1 - 9
of 9
pro vyhledávání: '"S. Y. Narayan"'
Publikováno v:
Journal of Crystal Growth. 150:1354-1357
Multiple quantum-well (MQW) lasers with metastable InGaAsSb quantum wells and AlGaAsSb barriers and claddings were grown on n+−GaSb(100) substrates by molecular beam epitaxy. The lasers exhibited a lasing wavelength of 2.78 μm and pulsed operation
Autor:
H. Lee, L. A. DiMarco, R. J. Matarese, Pamela K. York, Ramon U. Martinelli, R. J. Menna, M. G. Harvey, John C. Connolly, S. Y. Narayan, D. Z. Garbuzov
Publikováno v:
Applied Physics Letters. 70:2931-2933
AlGaAsSb/InGaAsSb single-quantum-well (SQW) laser diodes emitting at 2 μm were fabricated and tested. At 10–15 °C, the uncoated SQW lasers with 2–3 mm cavity lengths exhibit a threshold current density of 115 A/cm2, a continuous-wave output pow
Autor:
S. Y. Narayan, H. Lee, Pamela K. York, R. J. Menna, D. Z. Garbuzov, Ramon U. Martinelli, John C. Connolly
Publikováno v:
Applied Physics Letters. 69:2006-2008
Broadening the waveguides of 2 μm AlGaAsSb/InGaAsSb separate‐confinement multiquantum‐well lasers decreases their internal losses to 2 cm−1, while threshold current densities remain as low as 300 A/cm2. The consequently high cw differential ef
Autor:
John C. Connolly, R. J. Menna, S. Y. Narayan, D. Z. Garbuzov, Ramon U. Martinelli, H. Lee, P. K. York
Publikováno v:
Applied Physics Letters. 67:1346-1348
We have demonstrated continuous wave operation of 2.7‐μm InGaAsSb/AlGaAsSb multiquantum‐well diode lasers up to a temperature of 234 K (−39 °C). These devices were grown by molecular‐beam‐epitaxy. They have a tendency to operate in a domi
Autor:
Pamela K. York, R. J. Menna, John C. Connolly, D. Z. Garbuzov, Ramon U. Martinelli, H. Lee, S. Y. Narayan
Publikováno v:
Applied Physics Letters. 66:1942-1944
We describe room‐temperature 2.78 μm AlGaAsSb/InGaAsSb multiquantum well lasers. Pulsed laser operation was observed at 15 °C with a threshold current of 1.1 A (10 kA/cm2), and a maximum power output of 30 mW, and a maximum differential quantum e
Autor:
S. G. Liu, S. Y. Narayan
Publikováno v:
Journal of Electronic Materials. 13:897-911
We report the use of tungsten-halogen lamps for rapid (−10 s) thermal annealing of ion-implanted (100) GaAs under AsH3/Ar and N2 atmospheres. Annealing under flowing AsH3/Ar was carried out without wafer encapsulation. Rapid capless annealing activ
Publikováno v:
Applied Physics Letters. 41:72-75
We describe a 750‐keV, 5–10×1012 cm−2 dose, 40Ar implant pretreatment for semi‐insulating (SI) GaAs substrates allowing generation of 28Si implanted n layers with higher mobility and/or activation efficiency. This effect was observed in Brid
Autor:
P. D. Gardner, S. Y. Narayan
Publikováno v:
SPIE Proceedings.
This paper describes the characteristics of the InP/low-temperature-deposited SiO2 MIS system, with emphasis on C-V hysteresis and drain current drift in InP MISFETs. The SiO2 was deposited using a low-pressure (2 Torr) Hg-assisted UV deposition syst
Publikováno v:
Semiconductor Growth Technology.
Vapor-phase epitaxy (VPE) systems for the growth of 1) GaAs on Cr-doped GaAs substrates, and 2) lattice matched GaInAs and GaInAsP on Fe-doped InP substrates are briefly described. Layer composition of the ternary and quaternary compounds were measur