Zobrazeno 1 - 2
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pro vyhledávání: '"S. W. Whitehair"'
Autor:
J. Cuomo, D. Guarnieri, Y. Vladimirsky, O. Vladimirsky, Inna V. Babich, S. W. Whitehair, Juan R. Maldonado, R. Fuentes
Publikováno v:
Microelectronic Engineering. 13:347-350
Experimental results are presented on the light scattering properties of x-ray mask substrates relevant to x-ray lithography systems utilizing optical alignment between mask and wafer. The results are compared with a simple light scattering model sim
Autor:
D. Guarnieri, R. Fuentes, Juan R. Maldonado, Y. Vladimirsky, S. W. Whitehair, O. Vladimirsky, Jerome J. Cuomo, A. Starikov
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 8:1579
The purpose of this paper is to present experimental results on optical properties of x‐ray mask substrates relevant to x‐ray lithographysystems utilizing optical alignment between mask and wafer. Data on mask substrates of several materials incl