Zobrazeno 1 - 10
of 59
pro vyhledávání: '"S. Vallon"'
Autor:
Charlott S. Vallon, Francesco Borrelli
This article proposes a hierarchical learning architecture for safe data-driven control in unknown environments. We consider a constrained nonlinear dynamical system and assume the availability of state-input trajectories solving control tasks in dif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a93ec0fce3b4fc2e9386bee5155b8e7d
http://arxiv.org/abs/2105.06005
http://arxiv.org/abs/2105.06005
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Autor:
C. Morin, C. Monget, M. Pons, L. Vallier, S. Vallon, F. H. Bell, J. L. Regolini, Olivier Joubert, Isabelle Sagnes
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 15:1874-1880
High density plasma etching processes using halogen based chemistries have been studied for 0.2 μm polysilicon-germanium gate patterning. Bilayer gate stacks consisting of 80 nm polycrystalline Si on 120 nm polycrystalline Si1−xGex (x was varied b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f36689d2b5b439f820ca2572b826a4b7
https://doi.org/10.1116/1.580654
https://doi.org/10.1116/1.580654
Publikováno v:
Journal of The Electrochemical Society. 144:2455-2461
The chemical distribution of oxide-masked polycrystalline Si 0.45 Ge 0.55 structures etched using gas mixtures of Cl 2 , HBr, and O 2 has been investigated by x-ray photoelectron spectroscopy (XPS). The 200 mm diam wafers were etched in a low-pressur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6540c860f8e0b5df64f196936f8651f0
https://doi.org/10.1149/1.1837836
https://doi.org/10.1149/1.1837836
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 15:865-870
The use of in situ diagnostic tools, allowing real-time control during plasma-processing steps, may become a key issue in designing robust processes and reducing costs for the next generations of integrated circuits. Real-time ellipsometry is capable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bff03397fb2d4271a594d008edec62c4
https://doi.org/10.1116/1.580722
https://doi.org/10.1116/1.580722
Publikováno v:
Applied Surface Science. 108:177-185
The exposure of polypropylene to an argon plasma is studied by in situ spectroscopic ellipsometry in the UV-visible and in the IR range. The results are correlated with amorphous phase extraction and proton nuclear magnetic resonance (NMR) analysis.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8246d408a69efa8780757cf43705ec78
https://doi.org/10.1016/s0169-4332(96)00574-0
https://doi.org/10.1016/s0169-4332(96)00574-0
Autor:
A. Hofrichter, Ludvik Martinu, S. Vallon, Bernard Drevillon, Fabienne Poncin-Epaillard, Jolanta E. Klemberg-Sapieha
Publikováno v:
Thin Solid Films. :68-73
We investigated the influence of plasma pretreatment in Ar and in an ArN 2 mixture on the adhesion of plasma-deposited silica layers to polypropylene (PP). In situ UV-visible ellipsometry measurements enabled us to detect cross-linking at the poly
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0af769d0e54e78896cfd91a4a0ba4238
https://doi.org/10.1016/s0040-6090(96)09132-8
https://doi.org/10.1016/s0040-6090(96)09132-8
Autor:
Bernard Drevillon, Ludvik Martinu, S. Vallon, Jolanta-Ewa Klemberg-Sapieha, Fabienne Poncin-Epaillard
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:3194-3201
The influence of argon plasma on polycarbonate (PC) was studied in terms of structural changes, reaction mechanisms, and adhesion. In situ ultraviolet‐visible ellipsometry reveals formation of a surface layer with a higher refractive index than the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30f61c0d1d8e90fd11a0626503367a2c
https://doi.org/10.1116/1.580212
https://doi.org/10.1116/1.580212
Autor:
S. Vallon, B. Mutel, charafeddine Jama, Jean Grimblot, P. Goudmand, Léon Gengembre, B. Drevillon, O. Dessaux
Publikováno v:
Surface Science. :490-494
Industrial PC and PET specimens have been treated by CRNP with pure N 2 or with N 2 -O 2 mixtures in order to modify their adhesion and surface properties. Scanning electron microscopy (SEM), IR ellipsometry, XPS analyses and wettability measurements
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec2e26928331f84d803789865fbe4136
https://doi.org/10.1016/0039-6028(95)01185-4
https://doi.org/10.1016/0039-6028(95)01185-4
Autor:
L. Guyot, Jolanta-Ewa Klemberg-Sapieha, Fabienne Poncin-Epaillard, A. Hofrichter, Bernard Drevillon, Ludvik Martinu, S. Vallon
Publikováno v:
Journal of Adhesion Science and Technology. 10:1287-1311
We have studied the influence of plasma treatment in various gases (Ar, NH3, N2) on the surface modification of polycarbonate (PC) and on the adhesion of plasma-deposited silica layers to PC. Surface modification was investigated using in situ IR ell
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9763c8016bb43a005cacc93573ab3e22
https://doi.org/10.1163/156856196x00256
https://doi.org/10.1163/156856196x00256