Zobrazeno 1 - 9
of 9
pro vyhledávání: '"S. V. Subach"'
Autor:
I. V. Ivonin, S. V. Subach
Publikováno v:
Russian Physics Journal. 49:580-588
The composition of the adsorption layer formed on the GaAs (001) surface at the initial stages of heteroepitaxial growth of InP in a chloride vapor-transport system is calculated within a thermodynamic approach. The obtained results allow us to under
Autor:
S. V. Subach, V. V. Preobrazhenskii, B. R. Semyagin, L. L. Anisimova, Anton K. Gutakovskii, I. V. Ivonin, Mikhail A. Putyato
Publikováno v:
Journal of Structural Chemistry. 45:S96-S102
Results are obtained from the experimental studies (atomic force and transmission microscopy) of the influence of III/V flux ratio on the topography and internal structure of LT MBE films of InGaAs and GaAs. The layers are shown to contain both the s
Autor:
M. D. Vilisova, L. G. Lavrent'eva, I. A. Bobrovnikova, S. V. Subach, V. V. Preobrazhenskii, I. V. Ivonin, S. E. Toropov, B. R. Semyagin, Mikhail A. Putyato
Publikováno v:
Semiconductors. 37:1047-1052
The effect of dopant concentration and growth-surface crystallographic orientation on the incorporation of Si into Ga and As sublattices was investigated during GaAs molecular-beam epitaxy. The epitaxial layers (epilayers) were grown on GaAs substrat
Autor:
M. D. Vilisova, S. E. Toropov, S. V. Subach, L. G. Lavrent'eva, B. R. Semyagin, V. V. Preobrazhenskii, I. A. Bobrovnikova, I. V. Ivonin, M. A. Putyato
Publikováno v:
Russian Physics Journal. 45:414-418
The influence of crystallographic orientation of the growth surface near (100) and (111)A GaAs singular faces on the silicon capture into A- and B-sublattices of gallium arsenide in molecular beam epitaxy is investigated by the electrophysical and ph
Autor:
L. G. Lavrent'yeva, M. D. Vilisova, B. Bobrovnikova, S. V. Subach, V. V. Preobrazhenskii, B. R. Semyagin, I. V. Ivonin, Mikhail A. Putyato
Publikováno v:
Russian Physics Journal. 43:816-820
InGaAs layers grown by low-temperature molecular-beam epitaxy on InP substrates at variable flow ratios between elements of groups III and V are investigated. Layers with a defect structure and low electrophysical parameters are shown to grow with an
Autor:
S. V. Subach, M. D. Vilisova, I. T. Shulepov, T. V. Korableva, V. S. Lukash, L. G. Lavrent'eva, I. V. Ivonin, M. P. Yakubenya
Publikováno v:
Russian Physics Journal. 42:17-21
It is known that during gas-phase epitaxy of InP and GaAs the region of the film close to the heteroboundary is formed with altered phase, structural, and electrophysical properties. The main cause for this is formation of a transition layer due to a
Autor:
S. V. Subach, E. V. Chernikov, V. S. Lukash, I. V. Ivonin, A. N. Tarzimyanov, L. G. Lavrent'eva
Publikováno v:
Russian Physics Journal. 39:571-575
The initial stages in the growth of indium phosphide films on gallium arsenide substrates in a chloride gastransport system are investigated by transmission electron microscopy and electron-diffraction and secondaryion mass spectrometry techniques. I
Autor:
B. R. Semyagin, Yu. G. Musikhin, N. A. Bert, L. G. Lavrentieva, Mikhail A. Putyato, S. V. Subach, V. V. Preobrazhenskii, M. D. Vilisova, V. V. Chaldyshev, I. V. Ivonin, M. P. Yakubenya
Publikováno v:
Scopus-Elsevier
This paper describes studies of InGaAs layers grown by molecular-beam epitaxy on InP (100) substrates at temperatures of 150–480 °C using various arsenic fluxes. It was found that lowering the epitaxy temperature leads to changes in the growth sur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1873c5027b6abd71ef5fc1d7c3f3607d
http://www.scopus.com/inward/record.url?eid=2-s2.0-0033177755&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-0033177755&partnerID=MN8TOARS
Autor:
M. P. Yakubenya, S. V. Subach, V. V. Preobrazhenskii, D. I. Lubyshev, V. V. Chaldyshev, I. V. Ivonin, A. I. Veinger, M. D. Vilisova, I. A. Bobrovnikova, B. R. Semyagin, L. G. Lavrent'eva, Mikhail A. Putyato
Publikováno v:
Scopus-Elsevier
We study epitaxial GaAs and InGaAs films produced by molecular-beam epitaxy in the temperature range 150–480°C and with various arsenic partial pressures. We determine the structural and electrophysical characteristics of the film (the excess arse
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ed81a29e77bf6ba54dafeb823a71506d
http://www.scopus.com/inward/record.url?eid=2-s2.0-54649084848&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-54649084848&partnerID=MN8TOARS