Zobrazeno 1 - 1
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pro vyhledávání: '"S. V. Sreenivassan"'
Publikováno v:
SPIE Proceedings.
Step and Flash Imprint involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::367385eda5696b3280d9e377b184d66c
https://doi.org/10.1117/12.773970
https://doi.org/10.1117/12.773970
