Zobrazeno 1 - 7
of 7
pro vyhledávání: '"S. V. B. Janardhan Garikipati"'
Publikováno v:
Journal of biotechnology. 210
The solvent resistance capacity of Pseudomonas putida S12 was applied by using the organism as a host for biocatalysis and through cloning and expressing solvent resistant pump genes into Escherichia coli. P. putida S12 expressing toluene ortho monon
Autor:
Stanislaw Legowski, S. V. B. Janardhan Garikipati, Maciej Radosz, Kim Nicholas, Gui-Bing Zhao, Xudong Hu
Publikováno v:
Plasma Chemistry and Plasma Processing. 25:351-370
Laser-induced fluorescence (LIF) is an effective in-situ probe for NO concentrations below 300 ppm in a non-thermal plasma reactor. A new method has been developed to measure in-situ NO concentration in the reactor discharge region using a long-time
Publikováno v:
Chemical Engineering Science. 60:1927-1937
This work explores the effect of gas pressure on the rate of electron collision reactions and energy consumption for NO conversion in N 2 in a pulsed corona discharge reactor. A previous study showed that the rate constant of electron collision react
Publikováno v:
AIChE Journal. 51:1813-1821
The configuration of a nonthermal plasma reactor strongly affects the rate of electron collision reactions. Experiments involving the decomposition of NO in N2 were performed in a reactor in which the number of parallel reactor tubes varied from 1 to
Publikováno v:
AIChE Journal. 51:1800-1812
NO is mainly converted to NO2 by chemical oxidation in the presence of oxygen. Initial selectivity analysis shows that three electron collision reactions are important for NOx evolution in O2/N2. The rate constants of these reactions decrease with in
Publikováno v:
Applied and environmental microbiology. 75(20)
Whole-cell biocatalysis to oxidize naphthalene to 1-naphthol in liquid-liquid biphasic systems was performed. Escherichia coli expressing TOM-Green, a variant of toluene ortho -monooxygenase (TOM), was used for this oxidation. Three different solvent
Autor:
Xudong Hu, Gui-Bing Zhao, S. V. B. Janardhan Garikipati, Kim Nicholas, Stanislaw F. Legowski, Maciej Radosz
Publikováno v:
Plasma Chemistry & Plasma Processing; Aug2005, Vol. 25 Issue 4, p351-370, 20p