Zobrazeno 1 - 5
of 5
pro vyhledávání: '"S. Ts. Krivoshchapov"'
Publikováno v:
Scopus-Elsevier
The in situ Hall effect measurements at room temperature showed that formation of the atomically clean Si(111) 7×7 surface as a result of high-temperature annealing (T=1250°C, t=120–180 s) of n-Si reverses the majority carrier sign at the surface
Autor:
A. V. Konchenko, S. Ts. Krivoshchapov, D. L. Goroshko, N. G. Galkin, E. S. Zakharova, V. A. Ivanov
Publikováno v:
Surface Review and Letters. :257-265
By the method of in situ Hall effect measurements at room temperature, it was shown that the formation of a clean Si (111)(7×7) surface at high temperature annealing (T=1250°, t=120–180 s) of n-type conductivity silicon results in a change of the
Autor:
Leonid V. Sokolov, A. I. Nikiforov, B. Z. Ol’shanetskii, O. P. Pchelyakov, S. A. Teys, Yu. B. Bolkhovityanov, S. Ts. Krivoshchapov
Publikováno v:
Physics of the Solid State. 46:64-66
Different techniques for the fabrication of structures containing ensembles of ultrasmall germanium nanoclusters distributed with a high density over the substrate surface are discussed. How to control the morphology and ordering of these ensembles i
Publikováno v:
Physics, Chemistry and Application of Nanostructures.
Publikováno v:
Physics, Chemistry and Application of Nanostructures.