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Autor:
L. B. Bayu Aji, S. J. Shin, J. H. Bae, A. M. Engwall, J. A. Hammons, S. T. Sen-Britain, P. B. Mirkarimi, S. O. Kucheyev
Publikováno v:
Journal of Vacuum Science & Technology A. 41:023407
The deposition of thick B[Formula: see text]C films with low residual stress by conventional direct-current magnetron sputtering is accompanied by the formation of dust particulates contaminating the target, chamber, and substrates and leading to the