Zobrazeno 1 - 10
of 31
pro vyhledávání: '"S. Sitarek"'
Publikováno v:
Fibres and Textiles in Eastern Europe. 24:95-102
Autor:
Marek Wychowaniec, Krzysztof Kopczynski, Tomasz Kozlowski, Jarosław Kisielewski, Ryszard Stepien, S. Sitarek, Dariusz Litwin, Marek Daszkiewicz, Kamil Radziak, Adam Czyzewski, Jacek Galas, Jarosław Młyńczak
Publikováno v:
SPIE Proceedings.
The phenomenon of laser light scattering provides the technology for visualization and testing the inner structure and homogeneity of materials. Some of them excited by the laser light in the tomographic process can emit light the wavelength of which
Publikováno v:
SPIE Proceedings.
The paper presents a relatively simple though effective approach to fringe field processing for variable wavelengthinterferometry- related techniques including a detailed analysis of noise influence on the accuracy of fringe parameters extraction.
Publikováno v:
Atmospheric Research. 142:32-39
The properties of atmospheric aerosol under a cumulus base were studied using three-wavelength lidar. A growth of hygroscopic aerosol particles in a convective updraft and the activation of cloud condensation nuclei (CCN) were observed. A simple and
Autor:
Henryk A. Kowalski, Piotr Wikliński, S. Sitarek, Jacek Galas, Anna Tyburska-Staniewska, Dariusz Litwin, Marek Daszkiewicz, Andrzej Ramsza, Łukasz Dałek, Grzegorz Mazur, Janusz Rzeszut
Publikováno v:
SPIE Proceedings.
The paper concerns the development of an optical emission spectrometer with a helium microwave rotating plasma as the excitation source which is an alternative to ICP spectrometers. In the new solution helium is used as the plasma and carrier gases,
Autor:
Jacek Galas, Adam Czyzewski, Dariusz Litwin, Maciej Kochanowski, Katarzyna Kolacz, Maciej Socjusz, S. Sitarek
Publikováno v:
Optical Memory and Neural Networks. 21:86-93
This paper presents the Variable Wavelength Interferometry (VAWI) technique, its applications and expected research potential of this system equipped with a femtosecond laser. The system is configured for observation and measurement of local optical
Publikováno v:
Proc. SPIE 7141, 16th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics
The paper is aimed at describing measurement methodology for characterizing quality of a silicon wafer applied as a focusing element in the Scanning Helium Microscope and continues the struggle against phenomena decreasing accuracy. The focusing mirr
Publikováno v:
SPIE Proceedings.
The Scanning Helium Microscopy is a new technique currently under development. The paper is an overview of measurements of the geometrical characteristics of Silicon wafer concentrating on accuracy and closely related matters. In the microscope the h
Publikováno v:
SPIE Proceedings.
The paper provides new insights into Silicon wafer measurements in context of technological problems of developing a sophisticated measurement technique, which harnesses helium atom beam as a probe. Nano-resolution imaging techniques such as scanning
Publikováno v:
Nuclear Instruments and Methods in Physics Research B 253(2006), 236-240
EMRS Spring Meeting, 29.05.-03.06.2006, Nice, France
EMRS Spring Meeting, 29.05.-03.06.2006, Nice, France
The ultra-thin 2 in. diameter silicon (1 1 1)-H(1 × 1) wafer appeared to be a promising material for a mirror focusing He-atom beam in a scanning atom microscope. To increase achievable at present resolution from 1.5 μm to a sub-micron range the 50
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9501f81c445cd01881da5f04b9d934ae
https://www.hzdr.de/publications/Publ-8506-2
https://www.hzdr.de/publications/Publ-8506-2