Zobrazeno 1 - 10
of 187
pro vyhledávání: '"S. Schelz"'
Publikováno v:
Thin Solid Films. 519:605-613
MoSi2 coatings were deposited on Si (100) substrates by means of magnetron sputtering. The structural and optical properties of the coatings were then investigated through transmission electron microscopy (TEM) and UV–visible–near IR ellipsometry
Publikováno v:
Surface and Coatings Technology. 200:6384-6388
Self-supported zircon (ZrSiO 4 ) coatings have been deposited by means of atmospheric pressure plasma spraying, a high rate deposition method. Zircon is one of the technologically important oxide ceramic material known for its refractoriness, its low
Autor:
H. Estrade-Szwarckopf, S. Huet, A. Hadjadj, P. Roca i Cabarrocas, S. Schelz, Laifa Boufendi, B. Rousseau
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:529-535
The crystallization of hydrogenated nanostructured silicon (ns-Si:H) films deposited from Ar-silane mixture in a low-pressure pulsed radio-frequency glow discharge has been studied in relation with their structural and morphological properties. Diffe
Publikováno v:
Diamond and Related Materials. 7:1675-1683
The operating frequency of a microwave plasma system designed for polycrystalline diamond film deposition is lowered from 2450 to 915 MHz to allow for larger diameter substrate processing. The substrate diameter is limited to 80 mm by the size of the
Publikováno v:
Diamond and Related Materials. 7:1291-1302
Pretreating silicon substrates with various fluorocarbon plasmas strongly influences the nucleation density ND of diamond. Such pretreatments were achieved with microwave discharges either in pure CF4, in pure fluoroethylene (F2CCF2) or in an H2/C
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 15:2743-2749
The effect of silicon substrate pretreatment by hydrofluoric acid (HF) upon nucleation density (ND), surface roughness, and crystal quality of polycrystalline diamond films obtained by chemical vapor deposition has been investigated. Si(100) substrat
Publikováno v:
Diamond and Related Materials. 6:440-443
We have investigated the effect of silicon substrate pretreatment by hydrofluoric acid (HF) on diamond nucleation. Si (100) substrates were pretreated by ultrasonic scratching with a diamond powder suspension in methanol followed by HF (50%) etching
Publikováno v:
Diamond and Related Materials. 5:1402-1406
In order to gain insight into the adhesion mechanisms of diamond films, we examine Si substrates with three different crystallographic orientations at the various stages of the deposition process. This allows one to distinguish the surface phenomena
Autor:
Vladimir Jesus Trava Airoldi, Evaldo José Corat, S. Schelz, D. Guay, C. F. M. Borges, Michel Moisan
Publikováno v:
Journal of Applied Physics. 80:6013-6020
We have investigated the operating parameters controlling the average roughness Ra of diamond films obtained through chemical‐vapor deposition using microwave‐sustained plasmas. The plasma was provided by a surface‐wave discharge in the form of
Publikováno v:
Surface Science. 359:227-236
Carbon films have been prepared at different substrate temperatures (25–800°C) by evaporating carbon from a graphite source with an electron beam evaporation device. The films have been analyzed by in situ electron spectroscopy (UPS, XPS and EELS)