Zobrazeno 1 - 10
of 78
pro vyhledávání: '"S. S. Simeonov"'
Autor:
E Kafedjiiska, S S Simeonov
Publikováno v:
Semiconductor Science and Technology. 12:1016-1027
I - V forward current characteristics of Si Schottky diodes are measured in the 80 - 291 K temperature range. The apparent decrease of the electron barrier height at the metal - semiconductor (M - S) interface, , and the increase of the ideality fact
Publikováno v:
physica status solidi (a). 122:K147-K150
Les niveaux profonds aux complexes de lacunes donneuses sont des centres de generation-recombinaison. L'influence observee du bombardement des substrats de Si, avec des ions Ar de 1 keV, s'explique par la generation de tels niveaux profonds dans les
Autor:
S. S. Simeonov
Publikováno v:
Physical Review B. 36:9171-9181
An expression for the current across the space-charge layer at a semiconductor grain boundary is obtained. It is shown that this current is determined by combined diffusion and drift of the majority carriers across this space-charge layer and emissio
Publikováno v:
International Journal of Electronics. 48:511-517
Molybdenum layers are deposited on GaAs by MoCl6 reaction with H2. During the deposition the GaAs substrates are heated to 400°C. The forward current of prepared Mo-(n)GaAs structure increases over five decades in accordance with the relation J=J0 e
Autor:
M. D. Ivanovich, S. S. Simeonov
Publikováno v:
Physica Status Solidi (a). 82:275-284
The recombination currents in the space charge layer of abrupt pn junctions, calculated by computer, for different doping levels and different position of recombination levels in the semiconductor energy gap, are presented. The movement of the point
Autor:
S. S. Simeonov, M. D. Ivanovitch
Publikováno v:
Physica Status Solidi (a). 80:79-84
The position of the electron quasi-Fermi level at the metal–semiconductor boundary in the semiconductor space charge layer is determined in the case when the diffusion theory of electron transport is appropriate and when the electron mobility in th
Publikováno v:
Physica Status Solidi (a). 45:671-675
Tungsten is deposited on GaAs by WCl6 reaction with H2. The GaAs substrate is heated to 400 °C during the deposition. The forward current of W-n-GaAs structures prepared in such way increases exponentially over five decades in accordance with the th
Publikováno v:
Akusherstvo i ginekologiia [Akush Ginekol (Sofiia)] 2006; Vol. 45 (1), pp. 48-51.
Publikováno v:
Akusherstvo i ginekologiia [Akush Ginekol (Sofiia)] 2001; Vol. 40 (3), pp. 25-7.