Zobrazeno 1 - 10
of 310
pro vyhledávání: '"S. Nafis"'
Autor:
Z. A. S. Nafis, M. Nuzaimah, S. I. Abdul Kudus, Y. Yusuf, R. A. Ilyas, V. F. Knight, M. N. F. Norrrahim
Publikováno v:
Materials; Volume 16; Issue 2; Pages: 479
The efficacy of wood dust fibre treatment on the property of wood dust reinforced recycled polypropylene composite (r-WoPPC) filament was investigated. The wood dust fibre was treated using alkali, silane, and NaOH-silane. The treated wood fibre was
Autor:
Mustafa Mat Deris, Mohd Khalid Awang, Mohamad Afendee Mohamed, S. Nafis, Mohd Nordin Abdul Rahman, Mokhairi Makhtar
Publikováno v:
Journal of Fundamental and Applied Sciences; Vol 9, No 6S (2017): Special Issue; 854-868
Customer care plays an important role in a company especially in managing churn for Telecommunication Company. Churn is perceived as the behaviour of a customer to leave or to terminate a service. This behaviour causes the loss of profit to companies
Publikováno v:
Surface and Coatings Technology. 90:150-155
Thin films of aluminum were exposed in short increments to a plasma environment using a semiconductor plasma asher. The process gas was a mixture of air and oxygen. The total exposed oxygen fluence was 1.2 × 10 21 oxygen atoms cm −2 accumulated ov
Publikováno v:
Journal of Spacecraft and Rockets. 32:97-102
To study the effects of Atomic Oxygen on various thin film materials, fourteen thin film samples were exposed to the corrosive environment of low Earth orbit. Total exposure was 42 hours, resulting in a nominal atomic oxygen fluence of 2.2 X 1020 ato
Publikováno v:
Applied Surface Science. 63:17-21
In situ spectroscopic ellipsometry (SE) covering the spectral range from 280 to 1000 nm was performed during RF bias assisted electron cyclotron resonance (ECR) etching of SiO 2 , GaAs oxide, silicon, and GaAs by a CCl 2 F 2 /O 2 mixture. The etch ra
Autor:
John A. Woollam, R. A. Synowicki, Jeff Hale, S. Zaat, S. Nafis, Jane Peterkin, Robert D. Kubik
Publikováno v:
Thin Solid Films. 206:254-258
Using variable angle spectroscopic ellipsometry and atomic force microscopy (AFM), the surface roughness and oxidation of aluminum and titanium thin films have been studied as a function of substrate deposition temperature and oxygen plasma exposure.
Autor:
William A. McGahan, Blaine D. Johs, John A. Woollam, Paul G. Snyder, Natale J. Ianno, S. Nafis
Publikováno v:
Thin Solid Films. 233:253-255
The motivation for this work was to develop in-situ monitoring and control of electron cyclotron resonance (ECR) as an anisotropic etch doing minimal surface damage to electronic materials. We have used a modular rotating- analyzer spectroscopic elli
Publikováno v:
Journal of Applied Physics. 73:6347-6349
The magnetic properties of Co/Cu multilayers were investigated from 5 to 380 K and analyzed in terms of the interface magnetism and mean‐field model. The interface, which is about 1.2 A thick, is nonmagnetic at room temperature and becomes magnetic
Autor:
Z.S. Shan, Sy_Hwang Liou, C. P. Reed, S.S. Malhotra, R.J. Deangelis, John A. Woollam, S. Nafis, Gan Moog Chow, David J. Sellmyer
Publikováno v:
Journal of Applied Physics. 70:5882-5884
Nanostructured Co/Ag composite films were prepared by magnetron sputtering using a single target. The average crystallite sizes of Co and Ag in the films depend on the deposition conditions. As the substrate temperature increases from 100 °C to 600
Publikováno v:
Journal of Applied Physics. 70:6050-6052
Co/Cu and Co/Si multilayers of total thickness ∼3000 A were prepared by rf and dc magnetron sputtering. The nominal thicknesses of the individual layers were in the range of 4 to 100 A. A large coercivity (Hc) at 10 K was observed for very thin lay