Zobrazeno 1 - 10
of 12
pro vyhledávání: '"S. N. Knyazev"'
Autor:
S. N. Knyazev, A. V. Kudrya, N. Yu. Komarovskiy, Yu. N. Parkhomenko, E. V. Molodtsova, V. V. Yushchuk
Publikováno v:
Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 25:323-336
The development pace of advanced electronics raises the demand for semiconductor single crystals and strengthens the requirements to their structural perfection. Dislocation density and distribution pattern are most important parameters of semiconduc
Autor:
T. G. Yugova, V. A. Chuprakov, N. A. Sanzharovsky, A. A. Yugov, I. D. Martynov, S. N. Knyazev
Publikováno v:
Crystallography Reports. 67:1099-1104
Publikováno v:
Crystallography Reports. 67:323-326
Publikováno v:
Izvestiya Vysshikh Uchebnykh Zavedenii. Materialy Elektronnoi Tekhniki = Materials of Electronics Engineering. 24:27-33
A theoretical model has been developed that allows one to determine free electron density in n-GaAs from the characteristic points on far-infrared reflection spectra. It was shown that, in this case, it is necessary to take into account the plasmon-p
Publikováno v:
Crystallography Reports. 66:931-933
Publikováno v:
Crystallography Reports. 65:832-835
The structural features induced by twinning in tin- and tellurium-doped gallium arsenide crystals during their growth by the Czochralski method with liquid melt sealing by boric anhydride have been considered. It is shown that growth twins and edge f
Autor:
M. P. Dukhnovsky, P. A. Averichkin, T. G. Yugova, Yu. P. Kozlova, S. N. Knyazev, I. A. Belogorokhov, A. A. Donskov
Publikováno v:
Semiconductors. 50:555-558
The results of using carbidsiliconoxide (a-C:SiO1.5) films with a thickness of 30–60 nm, produced by the pyrolysis annealing of oligomethylsilseskvioksana (CH3–SiO1.5)n with cyclolinear (staircased) molecular structure, as intermediate films in t
Autor:
A. A. Yugov, S. N. Knyazev, Yu. P. Kozlova, M. P. Duhnovskii, S. S. Malahov, T. G. Yugova, I. A. Belogorokhov, A. A. Donskov
Publikováno v:
Semiconductors. 50:411-414
The effect of the type of substrate, sapphire substrate (c- and r-orientation) or GaN/Al2O3 template (c- and r-orientations), on the nitridation of an amorphous titanium nanolayer is shown. The effect of the titanium-nanolayer thickness on thick GaN
Publikováno v:
Crystallography Reports. 60:889-894
The structural quality and surface morphology of low-temperature (LT) buffer layers after deposition and high-temperature (HT) annealing and HT GaN layers grown on LT buffer layers by hydride vapor phase epitaxy have been investigated. The HCl flow r
Publikováno v:
Bulletin of Kalashnikov ISTU. 20:23
Проведено сравнительное исследование абразивной износостойкости стали Х12МФ после упрочнения с использованием термической обработки