Zobrazeno 1 - 10
of 34
pro vyhledávání: '"S. Mittl"'
Publikováno v:
Journal of the American College of Radiology. 17:1676-1683
Objective Pennsylvania Act 112 requires diagnostic imaging facilities to directly notify outpatients about significant imaging abnormalities that require follow-up care within 3 months. The effects of Act 112 on patient care are unclear. We sought to
Autor:
Charles E. Kahn, Tessa S. Cook, Joshua Cho, Gregory S. Mittl, Hanna M. Zafar, Paul A. Hill, Judy A. Shea
Publikováno v:
Journal of the American College of Radiology : JACR. 18(7)
Purpose The aim of this study was to evaluate the effect of Pennsylvania Act 112 notification reading level and presentation on patient understanding and anxiety. Methods Four notifications were developed by alternating 12th grade and 6th grade readi
Autor:
Gregory S. Mittl, Hanna M. Zafar, Paul A. Hill, Charles E. Kahn, Suehyb G. Alkhatib, Tessa S. Cook
Publikováno v:
Journal of the American College of Radiology : JACR. 17(2)
Publikováno v:
Current problems in diagnostic radiology. 48(1)
Characterize the clinical utility of diagnostic shoulder imaging modalities commonly used in the outpatient workup of shoulder pain.Retrospective review of adults imaged for outpatient shoulder pain from 1/1/2013 to 9/1/2015. To be categorized as "us
Autor:
Gregory S, Mittl, Joseph D, Zuckerman
Publikováno v:
Bulletin of the Hospital for Joint Disease (2013). 73(3)
Patients with significant gouty arthritis can develop disabling joint pain secondary to monosodium urate (MSU) articular deposition. We report a case of white, chalky MSU crystal deposition covering the articular surfaces of the knee as discovered by
Autor:
R. Mogilevsky, S. Burlay, S. Mittl, S. G. Nedilko, L. Sharafutdinova, V. Sherbatskii, V. Boyko
Publikováno v:
Optical Materials. 31:1880-1882
A relation between photoluminescence (PL) characteristics of different starting materials used for crystal growth and un-doped sapphire single crystals manufactured using various methods of crystal growth (Kyropolus, HEM, Czochralski, and EFG) was fo
Publikováno v:
Proceedings of the 20th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA).
A correlation study of middle-of-line (MOL) electrical test method with its inline polysilicon gate (PC) and the diffusion contacts (CA) photolithography overlay data is presented in this paper for wafers fabricated by gate first CMOS process at 32nm
Publikováno v:
BMJ Case Reports. :bcr2015210889
The differential diagnosis for altered mental status (AMS) is broad and aetiological pathologies can arise from nearly all organs and body systems. Further complicating the matter, the altered patient is poorly suited to provide a comprehensive and a
Publikováno v:
Proceedings of 1st International Symposium on Plasma Process-Induced Damage.
A comparison of techniques used to expose latent damage resulting from process-induced charging events is presented. In particular, the result of hot- electron stress is compared to Fowler-Nordheim stress for three different charging signatures. Alth
Autor:
J. Lee, Heon Lee, Charles W. Koburger, H. Hansen, S. Luce, J. Givens, William F. Clark, S. Holmes, Bijan Davari, D. Martin, S. Geissler, S. Mittl, J. Nakos, Scott R. Stiffler, James W. Adkisson
Publikováno v:
Proceedings of 1994 VLSI Technology Symposium.
An advanced half-micron CMOS technology is demonstrated. Devices with 0.25-/spl mu/m channel lengths provide high speed. Reduced supply voltage is employed to provide reliability with low-cost processing. A damascene tungsten interconnect fabricated