Zobrazeno 1 - 4
of 4
pro vyhledávání: '"S. L. Kriangsak"'
Autor:
K. Y. Au, Y.B. Yang, S Nathapong, Y. S. Koh Drake, P. L Ong Wilson, S. L. Kriangsak, Y. F. Zhang, J.D. Beleran
Publikováno v:
2011 IEEE 13th Electronics Packaging Technology Conference.
Through silicon via (TSV) is a three-dimensional packaging technology involving vertical chips stacking using metal-filled via holes and bumps. TSV stacked chip drastically reduces interconnect distance than conventional multi-stack wire bond silicon
Autor:
C. Surasit, John D. Beleran, K. Y. Au, C. H. Toh, Y.B. Yang, Y. F. Zhang, Y. S. Koh Drake, P. L Ong Wilson, S. L. Kriangsak
Publikováno v:
2011 IEEE 61st Electronic Components and Technology Conference (ECTC).
High performance, multi functional and package miniaturization will be the main driving forces that propel the future trend and development of fully integrated multi silicon dies stack using through silicon via (TSV) packaging technology. This paper
Autor:
Chee Houe Khong, W. S. Lee, Soon Wee Ho, C. H. Toh, Li Shiah Lim, S Nathapong, S. P. Chew, T. T. Chua, C. Ng, Hongyu Li, S. L. Kriangsak, X. F. Pang, Ebin Liao
Publikováno v:
2010 Proceedings 60th Electronic Components and Technology Conference (ECTC).
The 3 D interconnect technology with Thru Silicon Via (TSV) have gained tremendous advancement in recent years. Final adoption of TSV technologies requires a robust and cost competitive TSV processes. Sidewall plated TSV with polymer filling can redu
Publikováno v:
2010 Proceedings 60th Electronic Components and Technology Conference (ECTC).
Multi silicon dies stack using through silicon via (TSV) is required for higher performance, greater package miniaturization and more functionality electronic device. A through silicon interposer (TSI) enables interconnect pitch matching between a hi