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pro vyhledávání: '"S. Kadlec"'
Akademický článek
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Publikováno v:
Vacuum. 173:109161
Reactive magnetron sputtering is a well-established technique to deposit compound films with different composition. Target poisoning influences the process stability and gives rise to hysteresis effects. Recently, a double S-shaped hysteresis curve h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4d064907139fc19c85ad856deb371ee4
https://doi.org/10.1016/j.vacuum.2019.109161
https://doi.org/10.1016/j.vacuum.2019.109161
Gas aggregation nanocluster source — Reactive sputter deposition of copper and titanium nanoclusters
Publikováno v:
Surface and Coatings Technology. 205:S573-S576
Copper and titanium nanoclusters in Ar and in Ar + O 2 gas mixtures were prepared using a magnetron based gas aggregation cluster source designed for Ultra High Vacuum operation. A considerable influence of oxygen addition on the formation of cluster
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c6551c92d254a3d746d305f9f8146591
https://doi.org/10.1016/j.surfcoat.2010.12.027
https://doi.org/10.1016/j.surfcoat.2010.12.027
Autor:
S. Kadlec
Publikováno v:
Surface and Coatings Technology. 202:895-903
Development of new PVD processes and corresponding magnetron cathodes to meet the ever growing customer requirements is increasingly costly when done only by experimental iterations. Examples of such customer requirements are: (1) high thickness unif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bfa5c7a9ebccaf5ae8aa7b0882ed599a
https://doi.org/10.1016/j.surfcoat.2007.06.043
https://doi.org/10.1016/j.surfcoat.2007.06.043
Publikováno v:
International Journal of Thermophysics. 25:1415-1427
Determination of the solid–liquid phase transition point of a molecular substance requires calculation of the free energy in both phases. Progress has been made on this problem by modeling molecules as fused hard spheres and adding attraction and e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::65b725bf367a767554613bce06615e99
https://doi.org/10.1007/s10765-004-5747-8
https://doi.org/10.1007/s10765-004-5747-8
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 19:2554-2566
The WTi films were deposited by an unbalanced magnetron sputtering of a WTi (70:30 at. %) alloy target. The influence of the working gas (Ar) pressure, substrate bias, and substrate location on the composition of films was studied. The films deposite
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6543a9c21a75f5fc371b0e73b2fec2ea
https://doi.org/10.1116/1.1392401
https://doi.org/10.1116/1.1392401
Publikováno v:
Surface and Coatings Technology. 135:208-220
The plasma in a physical vapor deposition (PVD) system used for the deposition of hard coatings (TiN, CrN) was studied by means of a Langmuir probe and energy resolved spectroscopy (Balzers plasma process monitor PPM 421). I – V measurements gave t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14c7e43041bc85b4fc7046317b028eb3
https://doi.org/10.1016/s0257-8972(00)00998-1
https://doi.org/10.1016/s0257-8972(00)00998-1
Akademický článek
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Autor:
B. Navinšek, Peter Panjan, B. Meert, S Wouters, Lambert Stals, Carl Quaeyhaegens, Marijan Maček, S. Kadlec
Publikováno v:
Surface and Coatings Technology. :1211-1218
Plasma properties related to TiN deposition are compared in two triode ion-plating systems (System A and System B) using a low-voltage arc discharge. System A employs a magnetic field, confining the arc and the plasma, while System B does not. The sy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::149be12300940c12c6e73e4b001e0b1e
https://doi.org/10.1016/s0257-8972(99)00225-x
https://doi.org/10.1016/s0257-8972(99)00225-x
Energy and mass spectroscopy studies during triode ion plating of TiN films in two different layouts
Autor:
S. Kadlec, S Wouters, Carl Quaeyhaegens, Lambert Stals, B. Navinšek, Marijan Maček, Peter Panjan
Publikováno v:
Scopus-Elsevier
Plasma properties are compared in two triode ion-plating systems using a low-voltage arc discharge. The systems differ in the configuration of the chamber and magnetic field. Mass and energy distributions of positive ions during deposition of TiN fil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dd506089144ea4ed690b615d8c32d6a5
https://doi.org/10.1016/s0257-8972(98)00839-1
https://doi.org/10.1016/s0257-8972(98)00839-1