Zobrazeno 1 - 8
of 8
pro vyhledávání: '"S. K. Gullapalli"'
Publikováno v:
Applied Nanoindentation in Advanced Materials
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a81ffa09146cdaa470fb0b6fc5dc9aeb
https://doi.org/10.1002/9781119084501.ch3
https://doi.org/10.1002/9781119084501.ch3
Publikováno v:
Thin Solid Films. 520:1446-1450
Nitrogen incorporated tungsten oxide (WO 3 ) films were grown by reactive magnetron sputter-deposition by varying the nitrogen content in the reactive gas mixture keeping the deposition temperature fixed at 400 °C. The crystal structure, surface mor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::285749ad341efbb2a9d6ee5e39614ea2
https://doi.org/10.1016/j.tsf.2011.08.080
https://doi.org/10.1016/j.tsf.2011.08.080
Autor:
Young Yun, Felicia S. Manciu, William Durrer, Chintalapalle V. Ramana, Jose L. Enriquez, S. K. Gullapalli
Publikováno v:
Journal of Materials Research. 25:2401-2406
We present a detailed study of the morphology and composition of tungsten oxide (WO3) thin films, grown by radio frequency magnetron reactive sputtering at substrate temperatures varied from room temperature (RT) to 500 °C, using infrared (IR) absor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::36879de0700a567bad7800ed1351a8d6
https://doi.org/10.1557/jmr.2010.0294
https://doi.org/10.1557/jmr.2010.0294
Publikováno v:
ACS Applied Materials & Interfaces. 2:2623-2628
Nanocrystalline WO3 films were grown by reactive magnetron sputter-deposition by varying the substrate temperature in the range of 303(RT)-673 K. The structure and electrical transport properties of WO3 films were evaluated using X-ray diffraction an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ec8feded6db2b0f17270e139c263c14d
https://doi.org/10.1021/am1004514
https://doi.org/10.1021/am1004514
Publikováno v:
Chemical Physics Letters. 495:232-235
Cadmium sulfide (CdS) films have been produced by sputter-deposition varying the sputtering-power (P) in the range of 60–120 W. The crystal structure, morphology and chemical quality of the CdS films has been investigated employing X-ray diffractio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::87188c7461f0dbeea7cde7b23c76e3ca
https://doi.org/10.1016/j.cplett.2010.06.042
https://doi.org/10.1016/j.cplett.2010.06.042
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 28:824-828
Inherent processes in coal gasification plants produce hazardous hydrogen sulfide (H2S), which must be continuously and efficiently detected and removed before the fuel is used for power generation. An attempt has been made in this work to fabricate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96abeee36e938d66a996148e80eaabdc
https://doi.org/10.1116/1.3368495
https://doi.org/10.1116/1.3368495
Publikováno v:
RSC Advances. 4:8224
Yttria stabilized hafnia (YSH) coatings have been fabricated by magnetron sputtering, a physical vapor deposition (PVD) method. Coatings of a mixed composition of hafnia (HfO2) and zirconia (ZrO2) (YSHZ) stabilized by yttria (Y2O3) were also fabricat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4e861a0a3dc71bcddb29c615c9f0f6ad
https://doi.org/10.1039/c3ra44882g
https://doi.org/10.1039/c3ra44882g
Publikováno v:
Applied Physics Letters. 96:171903
Nanocrystalline tungsten oxide (WO3) films were grown by reactive magnetron sputter-deposition. The structure and optical properties of WO3 films were evaluated using grazing incidence x-ray diffraction and optical spectroscopic measurements. The eff
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e9c094d3d60bc37a869592ef1666288
https://doi.org/10.1063/1.3421540
https://doi.org/10.1063/1.3421540