Zobrazeno 1 - 10
of 94
pro vyhledávání: '"S. Johnson Jeyakumar"'
Autor:
R. Rathika, M. Kovendhan, D. Paul Joseph, K. Vijayarangamuthu, A. Sendil Kumar, C. Venkateswaran, K. Asokan, S. Johnson Jeyakumar
Publikováno v:
Nuclear Engineering and Technology, Vol 51, Iss 8, Pp 1983-1990 (2019)
Spray deposited Molybdenum trioxide (MoO3) thin film of thickness nearly 379 nm were irradiated with 200 MeV Ag15+ ion beam at different fluences (Ø) of 5 × 1011, 1 × 1012, 5 × 1012 and 1 × 1013 ions/cm2. The X-ray diffraction (XRD) pattern of t
Externí odkaz:
https://doaj.org/article/e628b7e4403642a382f4ebd031190de1
Autor:
Jayamoorthi, Suganthi, S., Johnson Jeyakumar, J., Suthan Kissinger N., Radhakrishnan, Padmanaban
Publikováno v:
AIP Conference Proceedings; 2024, Vol. 3149 Issue 1, p1-5, 5p
Publikováno v:
Ceramics International. 49:18708-18727
Autor:
Jayamoorthi, Suganthi, S., Johnson Jeyakumar, J., Suthan Kissinger N., Radhakrishnan, Padmanaban
Publikováno v:
AIP Conference Proceedings Online; August 2024, Vol. 3149 Issue: 1 p090009-90013, 5p
Publikováno v:
Progress in Chemical Science Research Vol. 8 ISBN: 9788196311490
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f6d3a1d2bc383eb25c219035b43536c
https://doi.org/10.9734/bpi/pcsr/v8/19160d
https://doi.org/10.9734/bpi/pcsr/v8/19160d
Publikováno v:
Journal of Materials Science: Materials in Electronics. 33:10439-10449
Autor:
P. Jamila Jayanthi, I. Kartharinal Punithavathy, S. Johnson Jeyakumar, T. Elavazhagan, A. Muthuvel, M. Jothibas
Publikováno v:
Nanotechnology for Environmental Engineering. 7:883-891
Autor:
A. Rajeshwari, I. Kartharinal Punithavathy, S. Johnson Jeyakumar, M. Jothibas, S. Ajith Kumar
Publikováno v:
Journal of Materials Science: Materials in Electronics. 33:5953-5969
Publikováno v:
Materials Today: Proceedings. 49:1776-1781
The synthesis of Ce doped ZnO nanoparticles exhibits the enhancement of results and its favor to electronic properties. The minimum average crystal size was obtained from 8 wt% (8 nm). The weight percentage (wt%) of cerium doping concentration increa
Publikováno v:
Materials Today: Proceedings. 66:2207-2214