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pro vyhledávání: '"S. J. Peartona"'
Autor:
H. Cho, D. Johnson, J. R. Childress, S. Onishi, K. B. Jung, S. J. Peartona, Y. D. Park, Jan-Chen Hong
Publikováno v:
Journal of The Electrochemical Society. 146:2163-2168
Maximum etch rates of ∼400 A min -1 were obtained for Ni 0.8 Fe 0.2 and Ni 0.8 Fe 0.13 Co 0.07 thin films in CO/NH 3 inductively coupled plasmas (ICP). There is a small chemical contribution to the etch mechanism (i.e., formation of metal carbonyls
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5c39ccc00538f87b12419f5b6349dba3
https://doi.org/10.1149/1.1391907
https://doi.org/10.1149/1.1391907
