Zobrazeno 1 - 10
of 30
pro vyhledávání: '"S. Ishidzuka"'
Autor:
Y. Igari, Toshihiro Ando, Isao Kusunoki, M. Sakai, Tomohide Takami, M Nishitani-Gamo, S. Ishidzuka, Tsuyoshi Takaoka
Publikováno v:
Surface Science. 492:315-328
Diamond (CVD) and graphite (HOPG) samples were nitrided at room temperature by irradiation with 300–700 eV N2+ ion beams. X-ray photoelectron spectra (XPS) were recorded in situ during the nitridation. The XPS spectra of C1s and N1s core levels are
Autor:
Mikka Nishitani-Gamo, Tsuyoshi Takaoka, Toshihiro Ando, Y. Igari, Isao Kusunoki, S. Ishidzuka, Tomohide Takami
Publikováno v:
Diamond and Related Materials. 10:1676-1680
A homoepitaxially grown p-type diamond (001) surface was nitrided by irradiation with a 500-eV N + 2 ion beam. X-Ray photoelectron spectra (XPS) were taken in situ during the nitridation. The C1s and N1s XPS spectra were divided into three (A, ∼ 28
Publikováno v:
Applied Surface Science. :300-304
A 3C-silicon carbide (SiC) thin film grown on a Si(1 0 0) surface using an ethylene (C2H4) molecular beam has been studied by atomic force microscopy. At the center of the irradiation area of the ethylene beam, the shape of the SiC islands was rectan
Publikováno v:
Thin Solid Films. 376:89-98
The reaction of acetone with Si(111) surface between 750 and 900°C has been investigated by reflection high-energy electron diffraction (RHEED), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS). From RHEED observation,
Autor:
Mikka Nishitani-Gamo, Toshihiro Ando, Tsuyoshi Takaoka, Y. Igari, S. Ishidzuka, M. Sakai, Isao Kusunoki, Tomohide Takami
Publikováno v:
Diamond and Related Materials. 9:698-702
Diamond samples grown on Si substrates by chemical vapor deposition were nitrided at room temperature by irradiation of 300–700 eV N + 2 ion beams. The C 1s and N 1s XPS spectra were taken during nitridation and after annealing in ultrahigh vacuum.
Publikováno v:
Surface Science. :167-171
A clean Si(100) surface at 670°C in ultrahigh vacuum was irradiated with a C2H4 molecular beam produced from a nozzle at 900°C. The reaction products on the surface were investigated using X-ray photoelectron spectroscopy, reflection high-energy el
Publikováno v:
Applied Surface Science. :107-111
The nitridation of a Si(100) surface with a NH3 beam at temperatures between 600 and 900°C was studied using X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). Thicker film was formed at higher temperature. The compositio
Publikováno v:
Surface Review and Letters. :81-84
Nitridation of a Si(100) surface takes place with NH3 at temperatures higher than 600°C and with a low energy [Formula: see text] ion beam at room temperature, formating a thin film of nitride. The nitridation processes have been studied in situ und
Publikováno v:
Surface Science. 380:131-144
The reactions of Si(100) and (111) surfaces with a C 2 H 4 beam in ultrahigh vacuum were studied using high resolution X-ray photoelectron spectroscopy (XPS) at temperatures of 600–900°C. These reactions produce silicon carbide (SiC) layers on the
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