Zobrazeno 1 - 10
of 43
pro vyhledávání: '"S. Hausser"'
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 16:181-186
During the qualification of a 0.35-/spl mu/m CMOS process, it was observed that diffusion resistors showed a systematic mismatch, depending on the position on the wafer. The mismatch increased from the center of the wafer to the outer regions. Variou
Publikováno v:
Microelectronic Engineering. 21:345-348
We have investigated the etching characteristics of InAlAs for reactive ion etching (RIE) with mixtures of argon (Ar) and chlorine (Cl 2 ). Nearly vertical walls and a smooth surface morphology can be achieved for etch rates of up to 200 nm/min. For
Publikováno v:
Journal of Crystal Growth. 127:165-168
We report on growth investigations and results of low threshold current density GaInAsP/InP multiple quantum well (MQW) lasers emitting at a wavelength of 1.3 μm. Bulk layers and separate confinement heterostructure MQW laser diodes were grown by ch
Autor:
G. Blackham, P. Scarfield, K.H. Kraft, M. Barton, B. Meerschman, M. Vermandel, K. Van Belle, José Manuel Otón, Przemysław Kula, Dieter Cuypers, Morten Andreas Geday, A. Van Calster, Tomas Podprocky, H. De Smet, B. Maximus, X. Quintana, G. Van Doorselaer, S. Hausser, Roman Dabrowski, Noureddine Bennis, K. Murray
Publikováno v:
2007 Spanish Conference on Electron Devices, Proceedings
ResearcherID
ResearcherID
Liquid crystal on silicon (LCOS) combines two very well-known technologies, namely the IC/CMOS and the liquid crystal (LC) technologies. As both of these are very mature, it is obvious that LCOS has a huge potential for very high-end applications, mo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cce54530cba4061ce5b5c3c7dbc3489d
https://biblio.ugent.be/publication/441167/file/449943
https://biblio.ugent.be/publication/441167/file/449943
Publikováno v:
13th IEEE International Semiconductor Laser Conference.
We demonstrate 1300 nm SCH quantum well lasers grown by CBE with low threshold and high efficiency. Spontaneous emission measurements of these lasers indicate strong carrier leakage. This reduces To to values around 55 K. Recently, 1300 nm InGaAsP/In
Publikováno v:
Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002..
During the qualification of a 0.35/spl mu/m CMOS process, it was observed that diffusion resistors showed a systematic mismatch, depending on the position on the wafer. The mismatch increased from the center of the wafer to the outer regions. Various
Publikováno v:
Applied Physics Letters. 56:913-915
We report the determination of Auger recombination coefficients in bulk and quantum well InGaAs by time‐resolved luminescence measurements. In bulk InGaAs the coefficient is C=3.2×10−28 cm6/s and has the temperature dependence of the valence‐b
Autor:
S. Subbanna, H. Schweizer, E. Zielinski, G. Griffiths, M.H. Pilkuhn, S. Hausser, H. Kroemer, R. Stuber
Publikováno v:
IEEE Journal of Quantum Electronics. 23:977-982
The material system GaSb/AlSb is discussed with respect to laser applications. Optical gain measurements reveal that in GaSb/AlSb multiquantum well heterostructures, energy-dependent resonant loss mechanisms such as intervalence band absorption and A
Publikováno v:
IEEE Journal of Quantum Electronics. 23:969-976
Important laser parameters of GaAs/AlGaAs MQWH's were measured by means of optical gain spectroscopy. Unsaturated optical net gain spectra are carefully analyzed using a model for band-to-band transitions including momentum conservation and an energy
Publikováno v:
IEEE Journal of Quantum Electronics. 21:719-725
An excellent quantitative description of the temperature dependence of the laser threshold current density and of the relevant T o value of GaInAsP/InP 1.3 μm lasers has been reached by independent measurements of the recombination coefficients and