Zobrazeno 1 - 10
of 28
pro vyhledávání: '"S. F. Bergeron"'
Publikováno v:
IBM Journal of Research and Development. 26:580-589
The development and implementation of plasma processing techniques for silicon-gate FET manufacturing applications is described. Process requirements are discussed for the stripping of photoresist and the isotropic etching of thin films. A systematic
Autor:
S. F. BERGERON, R. J. WATTS
Publikováno v:
Chemischer Informationsdienst. 10
Publikováno v:
Asian Journals of Ecotoxicology; Oct2020, Vol. 15 Issue 5, p18-27, 10p
Autor:
McCafferty, Robert H.
Publikováno v:
Proceedings of SPIE; Nov1991, Issue 1, p331-339, 9p
Autor:
C. Bonnafé, G. Pfeiffer
Publikováno v:
Algebras & Representation Theory; Dec2008, Vol. 11 Issue 6, p577-602, 26p
Publikováno v:
Journal of Agricultural, Biological & Environmental Statistics (JABES); Mar2003, Vol. 8 Issue 1, p84-104, 21p
Publikováno v:
Toxicological Sciences; Feb2003, Vol. 71 Issue 2, p251-262, 12p, 3 Charts, 8 Graphs
Publikováno v:
Journal of Pharmacy & Pharmacology; Nov2001, Vol. 53 Issue 11, p1549-1554, 6p
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1988, Vol. 6 Issue 5, p1595-1599, 5p
Autor:
Kalyanasundaram, Kuppuswamy
Publikováno v:
Journal of the Chemical Society, Faraday Transactions 2: Molecular & Chemical Physics; Dec1986, Vol. 82 Issue 12, p2401-2415, 15p