Zobrazeno 1 - 10
of 29
pro vyhledávání: '"S. E. Hicks"'
Publikováno v:
Journal of Display Technology. 7:619-623
We used a polymer network to improve the response time of a vertical aligned (VA) mode liquid crystal display (LCD). The polymer network was anisotropic and was oriented in the same direction as the liquid crystal in the dark state. We studied the ef
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b95e05f337af4dd08f8682da9f34f98b
https://doi.org/10.1109/jdt.2011.2150410
https://doi.org/10.1109/jdt.2011.2150410
Publikováno v:
Thin Solid Films. 294:304-307
This paper reports our recent results on a new method for controlling the internal strain and light emission in Si–Si 1− x Ge x quantum dots (QD) by coating a special SiN x layer with controlled built-in stress. It was found that by changing the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::45f11f96accbce3b4dd36ff68573af6b
https://doi.org/10.1016/s0040-6090(96)09262-0
https://doi.org/10.1016/s0040-6090(96)09262-0
Publikováno v:
Microelectronic Engineering. 35:41-44
The resistance of PECVD SiN films to dry etching is increased by more than three orders of magnitude by exposure to an oxygen plasma. In this paper we describe the oxygen treatment. Both the film thickness and the refractive index are modified by the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a7de2ccfa6538f472734966b43a8cb07
https://doi.org/10.1016/s0167-9317(96)00139-6
https://doi.org/10.1016/s0167-9317(96)00139-6
Publikováno v:
Journal of Applied Physics. 77:4961-4966
A quantum well intermixing probe system has been used to study the damage in GaAs/AlGaAs due to exposure to C2F6 plasmas as a function of rf power. At an etching power of ≤80 W, the photoluminescence energy shift after rapid thermal processing is r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::298396c80843ef80b029ccefd6f391f3
https://doi.org/10.1063/1.359303
https://doi.org/10.1063/1.359303
Publikováno v:
Physical Review C. 49:103-115
Differential elastic and inelastic scattering cross sections have been measured for neutrons incident on $^{204}\mathrm{Pb}$ and $^{206}\mathrm{Pb}$ at energies of 2.5, 4.6, and 8.0 MeV and total cross sections in 100-keV steps from 250 keV to 4.0 Me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8476c0305ccc20f323ab9751f32d6787
https://doi.org/10.1103/physrevc.49.103
https://doi.org/10.1103/physrevc.49.103
Publikováno v:
ACM SIGSAC Review. 10:44-62
To establish a basis for discussion of security and privacy for data management, a few fundamental notions need to be defined. In its most general interpretation a database is a structured collection of information. A data management system is intend
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::71bb5e76c78dee07197a4b793d88e666
https://doi.org/10.1145/147092.147102
https://doi.org/10.1145/147092.147102
Autor:
R. A. G. Gibson, S. E. Hicks
Publikováno v:
Plasma Chemistry and Plasma Processing. 11:455-472
Using optical emission spectroscopy (OES) we have been able to distinguish three operating regimes for the ammonia-silane glow discharge used in plasma nitride deposition. By monitoring the deposition rate and analyzing the structure and composition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a14c0ffbd7c4d6133de77ac98f096e2b
https://doi.org/10.1007/bf01447159
https://doi.org/10.1007/bf01447159
Autor:
S. K. Murad, J.S. Aitchison, S. E. Hicks, John H. Marsh, Chris D. W. Wilkinson, A. Saher Helmy, A.C. Bryce
Publikováno v:
Applied Physics Letters. 74:732-734
By exposing the SiO2 films used as annealing caps in the process of impurity free vacancy disordering (IFVD) to an oxygen plasma, which is produced in a reactive ion etching machine, the effect of the exposed caps on quantum well intermixing can be s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::250543f23b4dd00adf4546615af75ba8
https://doi.org/10.1063/1.123106
https://doi.org/10.1063/1.123106
Publikováno v:
Philosophical Magazine B. 62:193-212
A range of amorphous hydrogenated silicon-carbide films have been produced using the plasma-enhanced chemical-vapour deposition technique with silane and methane diluted in hydrogen as the parent molecules. The air-exposed and sputter-cleaned surface
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::90f633818d342b3776326c3538acb2c9
https://doi.org/10.1080/13642819008226986
https://doi.org/10.1080/13642819008226986
Publikováno v:
Physical Review C. 41:2560-2570
Differential cross sections for neutron elastic and inelastic scattering from $^{48}\mathrm{Ca}$ are reported. Presently measured cross sections are for an incident energy of 7.97 MeV. These differential cross sections, total cross sections from 80 k
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9c195d1fa0f115d37cc2a4bc288d58c1
https://doi.org/10.1103/physrevc.41.2560
https://doi.org/10.1103/physrevc.41.2560