Zobrazeno 1 - 1
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pro vyhledávání: '"S. D. Waterman"'
Publikováno v:
Vacuum. 43:111-114
For the first time in the UK, the deposition of amorphous silicon-germanium layers from SiH 4 and GeH 4 gaseous sources has been carried out using plasma enhanced vapour deposition, at low temperatures and pressures. The partial pressures of the sour
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::05474d9cd3413dba40fd4e3fa3ee237a
https://doi.org/10.1016/0042-207x(92)90194-2
https://doi.org/10.1016/0042-207x(92)90194-2
