Zobrazeno 1 - 10
of 182
pro vyhledávání: '"S. Boninelli"'
Publikováno v:
APL Materials, Vol 11, Iss 11, Pp 111102-111102-10 (2023)
In the field of sustainability, hydrogen (H2) is considered a clean fuel and a renewable energy source with no pollutant emissions. The production of H2 by water electrolysis is well-known among the scientific community. Still, alkaline electrolysis
Externí odkaz:
https://doaj.org/article/f52d00f2597a470eb635025d6ea89ab3
Autor:
M. Agati, S. Boninelli, C. Calabretta, F. Mancarella, M. Mauceri, D. Crippa, M. Albani, R. Bergamaschini, L. Miglio, F. La Via
Publikováno v:
Materials & Design, Vol 208, Iss , Pp 109833- (2021)
In this paper we report the morphology and the microstructural properties of thick [1 1 1]-oriented 3C-SiC films epitaxially grown on T-shaped Si micropillars. This compliant substrate was designed to release the stress developed in 3C-SiC grown on S
Externí odkaz:
https://doaj.org/article/a54e75fd482c448780f0f6a27b160601
Autor:
S. Boninelli, R. Milazzo, R. Carles, F. Houdellier, R. Duffy, K. Huet, A. La Magna, E. Napolitani, F. Cristiano
Publikováno v:
APL Materials, Vol 6, Iss 5, Pp 058504-058504-7 (2018)
Laser Thermal Annealing (LTA) at various energy densities was used to recrystallize and activate amorphized germanium doped with phosphorous by ion implantation. The structural modifications induced during the recrystallization and the related dopant
Externí odkaz:
https://doaj.org/article/55b55139fb754a228021841f44efc0b1
Poster presented at the 2021 European Conference on Silicon Carbide and Related Materials(ECSCRM).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4095d0ae4b77be675798ca3b33a4ac87
Autor:
Cristiano Calabretta, Roberto Bergamaschini, Danilo Crippa, F. La Via, Marco Mauceri, Fulvio Mancarella, Leo Miglio, M Albani, S. Boninelli, Marta Agati
Publikováno v:
Materials & Design, Vol 208, Iss, Pp 109833-(2021)
In this paper we report the morphology and the microstructural properties of thick [1 1 1]-oriented 3C-SiC films epitaxially grown on T-shaped Si micropillars. This compliant substrate was designed to release the stress developed in 3C-SiC grown on S
Akademický článek
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Autor:
S. Boninelli, Lucia Calcagno, Cristiano Calabretta, Nicolò Piluso, Andrea Severino, Giuseppe Arena, Fabrizio Roccaforte, Filippo Giannazzo, Patrick Fiorenza, D. Mello
Publikováno v:
Materials science forum 963 (2019): 407–411. doi:10.4028/www.scientific.net/MSF.963.407
info:cnr-pdr/source/autori:Severino A.; Mello D.; Boninelli S.; Roccaforte F.; Giannazzo F.; Fiorenza P.; Calabretta C.; Calcagno L.; Piluso N.; Arena G./titolo:Effects of thermal annealing processes in phosphorous implanted 4H-SiC layers/doi:10.4028%2Fwww.scientific.net%2FMSF.963.407/rivista:Materials science forum/anno:2019/pagina_da:407/pagina_a:411/intervallo_pagine:407–411/volume:963
info:cnr-pdr/source/autori:Severino A.; Mello D.; Boninelli S.; Roccaforte F.; Giannazzo F.; Fiorenza P.; Calabretta C.; Calcagno L.; Piluso N.; Arena G./titolo:Effects of thermal annealing processes in phosphorous implanted 4H-SiC layers/doi:10.4028%2Fwww.scientific.net%2FMSF.963.407/rivista:Materials science forum/anno:2019/pagina_da:407/pagina_a:411/intervallo_pagine:407–411/volume:963
Silicon carbide (SiC) is an attractive material for power devices owing to the availability of high-quality epitaxial wafers and superior physical properties, such as its high breakdown electric field strength, high electron mobility, and low anisotr
Akademický článek
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Autor:
Filadelfo Cristiano, Sebastien Kerdiles, A. La Magna, S. Boninelli, Karim Huet, P. Acosta Alba, Eléna Bedel-Pereira, Hiba Rizk, Fulvio Mazzamuto, Richard Monflier, Julien Roul, Emmanuel Scheid, Toshiyuki Tabata
Publikováno v:
Applied Surface Science
Applied Surface Science, 2021, 536, pp.149071. ⟨10.1016/j.apsusc.2021.149071⟩
Applied Surface Science, Elsevier, 2021, 536, pp.149071. ⟨10.1016/j.apsusc.2021.149071⟩
Applied Surface Science, 2021, 536, pp.149071. ⟨10.1016/j.apsusc.2021.149071⟩
Applied Surface Science, Elsevier, 2021, 536, pp.149071. ⟨10.1016/j.apsusc.2021.149071⟩
International audience; In this work, we present a comprehensive investigation of impurities contamination in silicon during UV Nanosecond Laser Annealing at high energy density. By investigating in detail the impact of the annealing ambient and of t
Akademický článek
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