Zobrazeno 1 - 10
of 73
pro vyhledávání: '"S. A. Zavadski"'
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 22, Iss 2, Pp 20-31 (2024)
The article discusses the current trends in the development of ion-plasma systems for ion processing and thin film deposition. Application of pulsed reactive magnetron sputtering for deposition of vanadium oxide films and dependence of process parame
Externí odkaz:
https://doaj.org/article/a42cd7b4b07f4d7fbc7afbdd766b2608
Autor:
Van Trieu Tran, K. V. Korsak, P. E. Novikov, I. Yu. Lovshenko, S. M. Zavadski, D. A. Golosov, A. A. Stepanov, A. А. Hubarevich, V. V. Kolos, Ya. A. Solovjov, D. S. Liauchuk, V. R. Stempitsky
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 21, Iss 6, Pp 84-91 (2024)
Determination of optical, mechanical and electrical characteristics is one of the decisive factors in the design of instrumentation structures of thermal uncooled bolometer-type detectors (microbolometers). The paper presents the results of optimizat
Externí odkaz:
https://doaj.org/article/1b17effb8f2f429681dc336325a7556f
Autor:
Van Trieu Tran, K. V. Korsak, P. E. Novikov, I. Yu. Lovshenko, S. M. Zavadski, D. A. Golosov, A. A. Stepanov, A. A. Hubarevich, V. V. Kolos, Ya. A. Solovjov, D. S. Liauchuk, V. R. Stempitsky
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 21, Iss 5, Pp 73-80 (2023)
The increased interest in utilizing uncooled thermal bolometer-type detectors (microbolometers) within the infrared or terahertz detection field is justified by their operational and technological characteristics, in particular: relatively low manufa
Externí odkaz:
https://doaj.org/article/c91b6b3675f945d59ace4d1514b04080
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 21, Iss 3, Pp 17-25 (2023)
The article proposes a model for predicting the content of metal components of complex oxide films deposited by reactive magnetron sputtering of a two-component composite target in Ar/O2 gas mixture. The model takes into account the sputtering yield
Externí odkaz:
https://doaj.org/article/b524e0c409084cd7835242f0144381e0
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 20, Iss 5, Pp 40-47 (2022)
Two-layer Al/Nb (1000/200 nm) was deposited by sputtering using a DC magnetron method on Si wafers. The anodizing was in 0.2 M oxalic solution at 53 V, re-anodized in the 0.5 M boric acid in potentiodynamic mode at increase of potential until 400 V.
Externí odkaz:
https://doaj.org/article/689df4a656b14385b76405783255bcab
Autor:
T. D. Nguyen, A. I. Zanko, D. A. Golosov, S. M. Zavadski, S. N. Melnikov, V. V. Kolos, N. К. Тоlochko
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 19, Iss 4, Pp 85-93 (2021)
The processes of reactive magnetron sputtering of a V target in Ar/O2 gas mixture are investigated. It was found that when using a pulsed current for sputtering and a pressure in the chamber less than 0.06 Pa, the intensities of the emission lines of
Externí odkaz:
https://doaj.org/article/8c672d6deeee442aaa95b3e6d0d64c43
Autor:
T. D. Nguen, A. I. Zanko, D. A. Golosov, S. M. Zavadski, S. N. Melnikov, V. V. Kolos, T. Q. To
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 19, Iss 3, Pp 22-30 (2021)
The aim of this work was to study the effect of the parameters of deposition process and subsequent annealing on the properties of vanadium oxide VOx films deposited by the pulsed reactive magnetron sputtering of a V target in an Ar/O2 gas mixture. T
Externí odkaz:
https://doaj.org/article/c83aa6f435e64d3490b0dbf5ffdb71d3
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 18, Iss 6, Pp 94-102 (2020)
The aim of this work was to study the effect of the gas composition during sputtering on the electrophysical properties of vanadium oxide films deposited by pulsed reactive magnetron sputtering of a vanadium target in an Ar/O2 medium of working gases
Externí odkaz:
https://doaj.org/article/204e18fb4806446e953a58a79a4b2bf7
Autor:
S. A. Zavadski, O. A. Yurtsev
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 0, Iss 6, Pp 5-11 (2019)
In the article the mutual coupling between radiators influence on electrical parameters of convex antenna array with doubly curved radiators placement surface is investigated. Yagi-Uda antennas are used as radiators. The integral equations method is
Externí odkaz:
https://doaj.org/article/45c42d823bfc4df3a10ce1ce16725c25
Autor:
A. H. Sohrabi, N. V. Gaponenko, M. V. Rudenko, S. M. Zavadski, D. A. Golosov, A. F. Guk, V. V. Kolos, A. N. Pyatlitski, A. S. Turtsevich
Publikováno v:
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, Vol 0, Iss 7, Pp 28-31 (2019)
The thin film capacitors were formed on silicon. The capacitor is based on the strontium titanate multi-layer which was fabricated using the sol-gel method after heat treatment at the temperature 750 or 800 °C. The lower and upper electrodes were ma
Externí odkaz:
https://doaj.org/article/438ca932fb7c4af780ecf0532c6ec3ba