Zobrazeno 1 - 4
of 4
pro vyhledávání: '"S. A. Rössinger"'
Autor:
M.P. Moret, M.A.C. Devillers, E.J. Haverkamp, H.A. Van der Linden, S. A. Rössinger, P.K. Larsen, P.R. Hageman, N. Duan
Publikováno v:
Ferroelectrics, 241, 1-4, pp. 149-158
Ferroelectrics, 241, 149-158
Ferroelectrics, 241, 149-158
Polycrystalline Pb(Zr, Ti)O3 thin films have been grown by Metalorganic Chemical Vapor Deposition (MOCVD) technique. The characterization of 200 nm thick polycrystalline Pb(Zr, Ti)O3 thin films on 6 inch diameter Pt/Ti/SiO2/Si substrates is reported.
Autor:
Th. Rasing, E. Ph. Pevtsov, Elena Mishina, N. E. Sherstyuk, A. S. Sigov, P.K. Larsen, M. P. Moret, K. A. Vorotilov, S. A. Rössinger
Publikováno v:
Applied Physics Letters, 78, 6, pp. 796-798
Applied Physics Letters, 78, 796-798
Applied Physics Letters, 78, 796-798
The polarization state of a thin Pb(ZrTi)O3 film is probed by optical second-harmonic generation (SHG) while applying an external voltage (a sine wave). A hysteresis in the SHG intensity is observed that corresponds to the dielectric hysteresis and i
Autor:
S.I. Misat, M.P. Moret, E.J. Haverkamp, P.R. Hageman, M.A.C. Devillers, H.A. Van der Linden, S. A. Rössinger, W.H.M. Corbeek, P.K. Larsen
Publikováno v:
Integrated Ferroelectrics, 31, 305-314
Integrated Ferroelectrics, 31, 1-4, pp. 305-314
Integrated Ferroelectrics, 31, 1-4, pp. 305-314
PbTiO3 thin films were grown by Metalorganic Chemical Vapor Deposition (MOCVD) on 6′′ platinized Si wafers. In a first stage of investigation, the quality of the platinum surface was correlated with the substrate temperature and the composition o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eb91d683fccc4e52ae2845087e14a431
http://hdl.handle.net/2066/112567
http://hdl.handle.net/2066/112567
Autor:
W.H.M. Corbeek, P.K. Larsen, S. A. Rössinger, H.A. Van der Linden, M.P. Moret, P.R. Hageman, S.I. Misat, E.J. Haverkamp
Publikováno v:
Integrated Ferroelectrics, 30, 1-4, pp. 71-79
Integrated Ferroelectrics, 30, 71-79
Integrated Ferroelectrics, 30, 71-79
Metal Organic Chemical Vapour Deposition was used to grow PbTiO3 and PbZrxTi1-xO3 thin films on Pt/Ti/SiO2/Si substrates. Incorporation of Pb and Ti into PbTiO3 was studied as a function of the growth temperature, gas phase composition, and reactor p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a8aae1462cb2f50b93ef2c616ba8bf06
https://hdl.handle.net/2066/112565
https://hdl.handle.net/2066/112565