Zobrazeno 1 - 10
of 1 616
pro vyhledávání: '"S P Kowalczyk"'
Autor:
R. A. Pethrick
Publikováno v:
Polymer International. 25:200-200
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:2791-2799
Pyromellitic dianhydride-4,4′-oxydianiline (PMDA–ODA) polyimide films have been studied using high resolution x-ray photoelectron spectroscopy and model semi-empirical INDO/S–CI calculations. Experimental and theoretical C 1s, N 1s, and O 1s sp
Publikováno v:
Journal of Applied Physics. 72:4912-4917
Chemical vapor deposition of Ta on the polyimide pyromellitic dianhydride oxydianiline was attempted using TaF5 as the precursor. The deposition temperature was 350 °C. Photoelectron spectroscopy measurements show that Ta is bound in a high oxidatio
Publikováno v:
Journal of Applied Physics. 70:3899-3906
The increasing need for metallization of microelectronic structures involving deep trenches and high aspect ratio features has sparked considerable interest in chemical vapor deposition metallization schemes. In this work the results of photoemission
Publikováno v:
Solid State Communications. 77:699-702
We studied the Cu 2p x-ray absorption spectra of the superconductor La2−xSrxCuO4 in the doping regime x=0-0.6 and found that the intensity of the satellite peak is a reliable measure of the doping-induced hole concentration. From the Cu 2p absorpti
Publikováno v:
Journal of Materials Science Letters. 10:374-376
On etudie les effets de la penetration de l'humidite et d'un redurcissement thermique, dans un milieu hydrothermique, sur l'adherence entre le chrome et le polyimide en fonction de la densite de la puissance de pulverisation
Publikováno v:
Applied Physics Letters. 57:667-669
The initial stages of WF6 and TaF5 adsorption on SiO2 and polyimide surfaces were investigated by photoelectron spectroscopy. WF6 selectively adsorbs on Si relative to SiO2 and polyimide, while TaF5 exhibited nonselective adsorption behavior. This tr
Publikováno v:
Nano Letters; Sep2009, Vol. 9 Issue 9, p3089-3095, 7p
Autor:
Zhu, Liangxin1,2 (AUTHOR), Liu, Rong1,2 (AUTHOR), Wan, Zhiyang1,2 (AUTHOR), Cao, Wenbo1,2 (AUTHOR), Dong, Chao1 (AUTHOR), Wang, Yang1,2 (AUTHOR), Chen, Chong1 (AUTHOR) cchen@issp.ac.cn, Chen, Junwei3 (AUTHOR) jwchen@hfut.edu.cn, Naveed, Faisal1,2 (AUTHOR), Kuang, Jiajin1,2 (AUTHOR), Lei, Longhui1,2 (AUTHOR), Cheng, Liquan1 (AUTHOR), Wang, Mingtai1 (AUTHOR) mtwang@ipp.ac.cn
Publikováno v:
Angewandte Chemie. 12/11/2023, Vol. 135 Issue 50, p1-9. 9p.
Autor:
Atsushi Fujimori
Publikováno v:
Journal of the Physical Society of Japan; 12/15/2024, Vol. 93 Issue 12, p1-10, 10p