Zobrazeno 1 - 8
of 8
pro vyhledávání: '"S J, Haney"'
Autor:
K. B. Nguyen, G. F. Cardinale, D. A. Tichenor, G. D. Kubiak, K. Berger, A. K. Ray-Chaudhuri, Y. Perras, S. J. Haney, R. Nissen, K. Krenz, R. H. Stulen, H. Fujioka, C. Hu, J. Bokor, D. M. Tennant, L. A. Fetter
Publikováno v:
Extreme Ultraviolet Lithography (TOPS).
This paper reports the first demonstration of MOS device fabrication using extreme ultraviolet lithography. The alignment strategy, mask layout, mask fabrication, and device characteristics will be reported.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::80ac561d1328ea7fac5c818e128d26c0
https://doi.org/10.1364/eul.1996.a208
https://doi.org/10.1364/eul.1996.a208
Autor:
D. A. Tichenor, A. K. Ray-Chaudhuri, G. D. Kubiak, K. B. Nguyen, S. J. Haney, K. W. Berger, R. P. Nissen, Y. E. Perras, P. S. Jin, L. I. Weingarten, P. N. Keifer, R. H. Stulen, R. N. Shagam, W. C. Sweatt, T. G. Smith, O. R. Wood, A. A. MacDowell, J. E. Bjorkholm, T. E. Jewell, F. Zernike, B. L. Fix, H. W. Hauschildt
Publikováno v:
Extreme Ultraviolet Lithography (TOPS).
An extreme ultraviolet (EUV) ring-field camera, comprised of 3 aspheric mirrors, has been fabricated and evaluated using visible light. The wavefront error (WFE) within a 1 mm × 25 mm field of view is 2.5 nm RMS. In a 10x Schwarzschild optic, having
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54c78b959c9b88033129ed5d62f82605
https://doi.org/10.1364/eul.1996.eww2
https://doi.org/10.1364/eul.1996.eww2
Autor:
D. A. Tichenor, A. K. Ray-Chaudhuri, G. D. Kubiak, S. J. Haney, K. W. Berger, R. P. Nissen, G. A. Wilkerson, R. H. Stulen, P. H. Paul, R. W. Arling, T. E. Jewell, Edita Tejnil, W. C. Sweatt, W. W. Chow, J. E. Bjorkholm, R. R. Freeman, M. D. Himel, A. A. MacDowell, D. M. Tennant, L. A. Fetter, O. R. Wood, W. K. Waskiewicz, D. L. White, D. L. Windt
Publikováno v:
Extreme Ultraviolet Lithography.
High-resolution imaging of a reflection mask over a 0.4 mm diameter field of view has been demonstrated using a new extreme ultraviolet (EUV) imaging system. A significant reduction in debris from the laser plasma source (LPS) has extended the life o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3f3187c38e9b4d0bebe946a4fd2ae379
https://doi.org/10.1364/eul.1994.eos.89
https://doi.org/10.1364/eul.1994.eos.89
Development and Characterization of a 10x Schwarzschild System for Soft-X-Ray Projection Lithography
Autor:
D. A. Tichenor, G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, R. P. Nissen, R. L. Schmitt, G. A. Wilkerson, L. A. Brown, P. A. Spence, P. S. Jin, W. C. Sweatt, W. W. Chow, J. E. Bjorkholm, R. R. Freeman, M. D. Himel, A. A. MacDowell, D. M. Tennant, O. R. Wood, W. K. Waskiewicz, D. L. White, D. L. Windt, T. E. Jewell
Publikováno v:
Soft X-Ray Projection Lithography.
Multilayer-coated Schwarzschild imaging objectives have been used to demonstrate high-resolution soft-x-ray imaging.1-2 In our previous work3 a 20x reduction Schwarzschild imaging objective served a useful tool for studying the mounting and alignment
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e75ad840084f645326d9ef8fd0ca48f
https://doi.org/10.1364/sxray.1993.tua.3
https://doi.org/10.1364/sxray.1993.tua.3
Autor:
D. A. Tichenor, G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, L. A. Brown, W. C. Sweatt, J. E. Bjorkholm, J. Bokor, R. R. Freeman, M. D. Himel, T. E. Jewell, A. A. MacDowell, W. M. Mansfield, D. M. Tennant, W. K. Waskiewicz, D. L. White, D. L. Windt, O. R. Wood
Publikováno v:
Optical Society of America Annual Meeting.
High resolution soft-x-ray projection images are recorded by using a laser plasma source (LPS) and multilayer coated optics. Soft x-rays are generated by focusing a KrF excimer laser beam on a moving gold target. The resulting 15-eV plasma emits an i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6a40847db8152628948a8ea500930f19
https://doi.org/10.1364/oam.1992.mvv5
https://doi.org/10.1364/oam.1992.mvv5
Autor:
D. A. Tichenor, G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, L. A. Brown, W. C. Sweatt, J. E. Bjorkholm, R. R. Freeman, M. D. Himel, A. A. MacDowell, D. M. Tennant, O. R. Wood, J. Bokor, T. E. Jewell, W. M. Mansfield, W. K. Waskiewicz, D. L. White, D. L. Windt
Publikováno v:
Soft-X-Ray Projection Lithography.
Projection imaging experiments are described. A Schwarzschild objective is illuminated with 14-nm radiation using an ellipsoidal condenser and a laser plasma source.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bdc0f7c72bd0c28aa27bec966560c0cf
https://doi.org/10.1364/sxray.1992.wa1
https://doi.org/10.1364/sxray.1992.wa1
Autor:
D. A. Tichenor, G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, L. A. Brown, R. R. Freeman, W. M. Mansfield, O. R. Wood, D. M. Tennant, J. E. Bjorkholm, T. E. Jewell, D. L. White, D. L. Windt, W. K. Waskiewicz
Publikováno v:
Soft-X-Ray Projection Lithography.
Previous experiments by AT&T Bell Laboratories [1] have demonstrated the feasibility of using a soft x-ray projection system to produce feature sizes down to 0.05 microns in a tri-level resist. Their experiments used a Schwarzschild objective and 140
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9551f379a0f27095c0a84c5852d237d4
https://doi.org/10.1364/sxray.1991.fc4
https://doi.org/10.1364/sxray.1991.fc4
Publikováno v:
Journal (Indiana Dental Association). 61(6)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::cd2cd5ffb3b760a9044e11a20a1ffbb5
https://pubmed.ncbi.nlm.nih.gov/6757331
https://pubmed.ncbi.nlm.nih.gov/6757331