Zobrazeno 1 - 10
of 32
pro vyhledávání: '"S A Lisitsyn"'
Publikováno v:
Russian Microelectronics. 48:72-79
The regimes of submicron and nanosized profiling of the KDB-10 Si(100) wafer surface by the focused ion beam (FIB) technique are experimentally investigated. It is established that with an increase in the ion beam current from 1 to 300 pA, the diamet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6710707007dec8f930b7ced240fb39aa
https://doi.org/10.1134/s1063739719020057
https://doi.org/10.1134/s1063739719020057
Autor:
S. A. Lisitsyn, V. S. Klimin, M. S. Solodovnik, S. V. Balakirev, Boris G. Konoplev, V. I. Avilov, Oleg A. Ageev, A. S. Kolomiytsev
Publikováno v:
Nanotechnologies in Russia. 13:26-33
The nanoscale profiling modes of epitaxial GaAs layers are experimentally studied through focused ion beams (FIB). The regularities of the influence of ion current and single FIB exposure time on the geometric characteristics of the forming nanosized
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f2d62953f5ed4fda9beaeb6ec5403aec
https://doi.org/10.1134/s199507801801007x
https://doi.org/10.1134/s199507801801007x
Autor:
Al. V. Bykov, Oleg A. Ageev, A. S. Kolomiytsev, S. A. Lisitsyn, Boris G. Konoplev, M. V. Il’ina, O. I. Il’in
Publikováno v:
Russian Microelectronics. 46:468-473
The results of experimental studies of the Pt structure with the thickness ranging from (0.48 ± 0.1) to (24.38 ± 0.1) nm ion beam including deposition by focused ion beam are presented. The rate of ion beam including deposition of Pt, which dependi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd6f4d219eb28c51ed70fa282c700c77
https://doi.org/10.1134/s106373971707006x
https://doi.org/10.1134/s106373971707006x
Publikováno v:
International Conference on Micro- and Nano-Electronics 2018.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c76e9c2ac9088a82c704e20e23609764
https://doi.org/10.1117/12.2522049
https://doi.org/10.1117/12.2522049
Autor:
S. V. Lisitsyn, M. Yu. Shevchenko, V.A. Tarala, D. P. Valyukhov, V. Ya. Martens, A. S. Altakhov
Publikováno v:
Inorganic Materials. 51:728-735
Aluminum nitride films have been grown by plasma-enhanced atomic layer deposition under self-limiting growth and CVD-like conditions. The films have been characterized by IR spectroscopy, ellipsometry, and Auger exposure spectroscopy. We have examine
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1d2d9a71c9e7213d7d896ffd9a0dc9f6
https://doi.org/10.1134/s0020168515070158
https://doi.org/10.1134/s0020168515070158
Autor:
S. A. Lisitsyn, Alexei S. Kolomiytsev, Vladimir A. Smirnov, Oleg A. Ageev, E. G. Zamburg, O. I. Il’in
Publikováno v:
Applied Mechanics and Materials. :154-158
This paper presents results of the formation of high aspect nanostructures by local deposition of carbon, stimulated by focused ion beam (FIB). The structures used in the modification of the probe sensors were cantilevers for atomic force microscopy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec0220bdfc718389d7e66d4617782201
https://doi.org/10.4028/www.scientific.net/amm.752-753.154
https://doi.org/10.4028/www.scientific.net/amm.752-753.154
Autor:
S. A. Lisitsyn, A. S. Kolomiytsev, O. I. Il’in, A. V. Vnukova, Boris G. Konoplev, A. L. Gromov, Oleg A. Ageev
Publikováno v:
Nanotechnologies in Russia. 9:145-150
In this work the results obtained in experimental studies of conditions of the nanoscale profiling of a silicon substrate surface under the ion stimulation of W and Pt deposition by a Ga+ ion beam are represented. It is shown that, according to combi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4ad93cd4df0a639bee19ccb7bdc5bf10
https://doi.org/10.1134/s1995078014020025
https://doi.org/10.1134/s1995078014020025
Publikováno v:
IOP Conference Series: Materials Science and Engineering. 699:012042
The results of an experimental study of the fabrication of high aspect probe tips for atomic force microscopy (AFM) and critical dimension AFM (CD AFM) using the focused ion beam (FIB) milling and ion beam induced deposition of carbon are presented.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6273e9a1b45611606538999295f499be
https://doi.org/10.1088/1757-899x/699/1/012042
https://doi.org/10.1088/1757-899x/699/1/012042
Publikováno v:
Journal of Physics: Conference Series. 1400:044005
This paper presents the results of experimental studies of the influence of the technological parameters of a focused ion beam (FIB) on the process of local ion-stimulated deposition of carbon and tungsten when creating elements of vacuum nanoelectro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::19b99106e4483623c59c2fb281348880
https://doi.org/10.1088/1742-6596/1400/4/044005
https://doi.org/10.1088/1742-6596/1400/4/044005
Autor:
A. S. Kolomiytsev, A. V. Vnukova, Alexander Alekseev, A. L. Gromov, Boris G. Konoplev, S. A. Lisitsyn, Oleg A. Ageev
Publikováno v:
Nanotechnologies in Russia. 9:26-30
The results of experimental studies of the resolving power and accuracy of nanosized profiling using focused ion beams (FIBs) are presented. Dependences of the resolving power on the ion beam current were obtained for the boron-doped (10 ohm cm (100)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cfdcabe66899b229ee4c26c89fa14bd7
https://doi.org/10.1134/s1995078014010029
https://doi.org/10.1134/s1995078014010029