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Autor:
Jacek TYCZKOWSKI, Ryszard KAPICA, Wiktor REDZYNIA, Marcin KOZANECKI, Mohamed M. CHEHIMI, Jan SIELSKI, Sławomir M. KUBERSKI
Publikováno v:
Medžiagotyra, Vol 19, Iss 3, Pp 270-276 (2013)
A series of pure and copper-doped cobalt oxide films was prepared by plasma-enhanced metalorganic chemical vapor deposition (PEMOCVD). The effect of Cu-doping on the chemical structure and morphology of the deposited films was investigated. Raman and
Externí odkaz:
https://doaj.org/article/02e364b3ed6a46c7a40881a726ee9178
