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Akademický článek

Aluminum Josephson junction microstructure and electrical properties modified by thermal annealing.

Autor: Korshakov ND; FMN Laboratory, Bauman Moscow State Technical University, Moscow, Russia, 105005.; Dukhov Automatics Research Institute, VNIIA, Moscow, Russia, 127030., Moskalev DO; FMN Laboratory, Bauman Moscow State Technical University, Moscow, Russia, 105005.; Dukhov Automatics Research Institute, VNIIA, Moscow, Russia, 127030., Soloveva AA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, Russia, 105005.; Dukhov Automatics Research Institute, VNIIA, Moscow, Russia, 127030., Moskaleva DA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, Russia, 105005.; Dukhov Automatics Research Institute, VNIIA, Moscow, Russia, 127030., Lotkov ES; FMN Laboratory, Bauman Moscow State Technical University, Moscow, Russia, 105005.; Dukhov Automatics Research Institute, VNIIA, Moscow, Russia, 127030., Ibragimov AR; FMN Laboratory, Bauman Moscow State Technical University, Moscow, Russia, 105005., Androschuk MV; FMN Laboratory, Bauman Moscow State Technical University, Moscow, Russia, 105005., Ryzhikov IA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, Russia, 105005.; Institute of Theoretical and Applied Electrodynamics, Russian Academy of Science, Moscow, Russia, 125412., Panfilov YV; FMN Laboratory, Bauman Moscow State Technical University, Moscow, Russia, 105005., Rodionov IA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, Russia, 105005. irodionov@bmstu.ru.; Dukhov Automatics Research Institute, VNIIA, Moscow, Russia, 127030. irodionov@bmstu.ru.

Publikováno v: Scientific reports [Sci Rep] 2024 Oct 30; Vol. 14 (1), pp. 26066. Date of Electronic Publication: 2024 Oct 30.

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Akademický článek

Integrated membrane-free thermal flow sensor for silicon-on-glass microfluidics.

Autor: Ryzhkov VV; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru., Echeistov VV; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru.; Dukhov Research Institute of Automatics, Moscow, 127055, Russia., Zverev AV; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru., Baklykov DA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru.; Dukhov Research Institute of Automatics, Moscow, 127055, Russia., Konstantinova T; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru., Lotkov ES; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru.; Dukhov Research Institute of Automatics, Moscow, 127055, Russia., Ryazantcev PG; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru., Sh Alibekov R; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru., Kuguk AK; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru., Aleksandrov AR; Dukhov Research Institute of Automatics, Moscow, 127055, Russia., Krasko ES; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru., Barbasheva AA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru., Ryzhikov IA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru., Rodionov IA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru.; Dukhov Research Institute of Automatics, Moscow, 127055, Russia.

Publikováno v: Lab on a chip [Lab Chip] 2023 Jun 13; Vol. 23 (12), pp. 2789-2797. Date of Electronic Publication: 2023 Jun 13.

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Akademický článek

Low-loss silicon nitride photonic ICs for near-infrared wavelength bandwidth.

Autor: Buzaverov KA, Baburin AS, Sergeev EV, Avdeev SS, Lotkov ES, Andronik M, Stukalova VE, Baklykov DA, Dyakonov IV, Skryabin NN, Saygin MY, Kulik SP, Ryzhikov IA, Rodionov IA

Publikováno v: Optics express [Opt Express] 2023 May 08; Vol. 31 (10), pp. 16227-16242.

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Akademický článek

Deep multilevel wet etching of fused silica glass microstructures in BOE solution.

Autor: Konstantinova TG; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Dukhov Automatics Research Institute, VNIIA, Moscow, 127030, Russia., Andronic MM; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia., Baklykov DA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Dukhov Automatics Research Institute, VNIIA, Moscow, 127030, Russia., Stukalova VE; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia., Ezenkova DA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Dukhov Automatics Research Institute, VNIIA, Moscow, 127030, Russia., Zikiy EV; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Dukhov Automatics Research Institute, VNIIA, Moscow, 127030, Russia., Bashinova MV; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia., Solovev AA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia., Lotkov ES; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Dukhov Automatics Research Institute, VNIIA, Moscow, 127030, Russia., Ryzhikov IA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia., Rodionov IA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. irodionov@bmstu.ru.; Dukhov Automatics Research Institute, VNIIA, Moscow, 127030, Russia. irodionov@bmstu.ru.

Publikováno v: Scientific reports [Sci Rep] 2023 Mar 30; Vol. 13 (1), pp. 5228. Date of Electronic Publication: 2023 Mar 30.

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Akademický článek

ITO film stack engineering for low-loss silicon optical modulators.

Autor: Lotkov ES; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia. lotevg@bmstu.ru.; Dukhov Automatics Research Institute, (VNIIA), Moscow, 127055, Russia. lotevg@bmstu.ru., Baburin AS; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Dukhov Automatics Research Institute, (VNIIA), Moscow, 127055, Russia., Ryzhikov IA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Institute for Theoretical and Applied Electromagnetics RAS, Moscow, 125412, Russia., Sorokina OS; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Dukhov Automatics Research Institute, (VNIIA), Moscow, 127055, Russia., Ivanov AI; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Dukhov Automatics Research Institute, (VNIIA), Moscow, 127055, Russia., Zverev AV; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Dukhov Automatics Research Institute, (VNIIA), Moscow, 127055, Russia., Ryzhkov VV; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia., Bykov IV; Institute for Theoretical and Applied Electromagnetics RAS, Moscow, 125412, Russia., Baryshev AV; Dukhov Automatics Research Institute, (VNIIA), Moscow, 127055, Russia., Panfilov YV; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia., Rodionov IA; FMN Laboratory, Bauman Moscow State Technical University, Moscow, 105005, Russia.; Dukhov Automatics Research Institute, (VNIIA), Moscow, 127055, Russia.

Publikováno v: Scientific reports [Sci Rep] 2022 Apr 15; Vol. 12 (1), pp. 6321. Date of Electronic Publication: 2022 Apr 15.

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Akademický článek

Self-Controlled Cleaving Method for Silicon DRIE Process Cross-Section Characterization.

Autor: Baklykov DA; FMN Laboratory, Bauman Moscow State Technical University, 105005 Moscow, Russia., Andronic M; FMN Laboratory, Bauman Moscow State Technical University, 105005 Moscow, Russia., Sorokina OS; FMN Laboratory, Bauman Moscow State Technical University, 105005 Moscow, Russia.; Dukhov Automatics Research Institute, (VNIIA), 127055 Moscow, Russia., Avdeev SS; FMN Laboratory, Bauman Moscow State Technical University, 105005 Moscow, Russia.; Dukhov Automatics Research Institute, (VNIIA), 127055 Moscow, Russia., Buzaverov KA; FMN Laboratory, Bauman Moscow State Technical University, 105005 Moscow, Russia.; Dukhov Automatics Research Institute, (VNIIA), 127055 Moscow, Russia., Ryzhikov IA; FMN Laboratory, Bauman Moscow State Technical University, 105005 Moscow, Russia.; Institute for Theoretical and Applied Electromagnetics RAS, 125412 Moscow, Russia., Rodionov IA; FMN Laboratory, Bauman Moscow State Technical University, 105005 Moscow, Russia.; Dukhov Automatics Research Institute, (VNIIA), 127055 Moscow, Russia.

Publikováno v: Micromachines [Micromachines (Basel)] 2021 May 08; Vol. 12 (5). Date of Electronic Publication: 2021 May 08.

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