Chemical-mechanical photoresist drying in supercritical carbon dioxide with hydrocarbon surfactants.

Autor: Zhang, Xiaogang, Pham, Joseph Q., Ryza, Nick, Green, Peter F., Johnston, Keith P.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2004, Vol. 22 Issue 2, p818-825, 8p