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of 6
pro vyhledávání: '"Ryutaro Yamaki"'
Autor:
Ryutaro Yamaki, Masahisa Ito, Hiroshi Sakurai, Yoshiharu Sakurai, Kosuke Suzuki, Ayako Sato, Masayoshi Itou
Publikováno v:
Key Engineering Materials. 643:39-43
We have applied two kinds of experimental methods using elliptically polarized synchrotron X-rays, magnetic Compton and Bragg scattering experiments, to a single crystal of a disordered Pd0.80Co0.20 alloy, and have measured magnetic Compton profiles
Autor:
Shohei Takamatsu, Ryutaro Yamakita
Publikováno v:
Asian Journal of Sport and Exercise Psychology, Vol 2, Iss 3, Pp 151-155 (2022)
Despite the recent advancement of athlete leadership studies, little is known about their applicability in East Asian countries such as Japan, and more importantly, their relationship to communication among team members. We therefore examined the rel
Externí odkaz:
https://doaj.org/article/880491b3bf2d45f3900e9c4da1b2219c
Autor:
Naoto Go, Kosuke Suzuki, Hiroshi Sakurai, Shun Emoto, Masayoshi Itou, Yoshiharu Sakurai, Ryutaro Yamaki
Publikováno v:
Key Engineering Materials. 497:8-12
We compare two Co/Pd multilayers with correspondingly smooth and rough interfaces. The first is a Co (1.5 nm)/Pd (2.6 nm) multilayer with a smooth interface deposited by the MBE technique, and the second is a Co (1.6 nm)/Pd (4.0 nm) multilayer with a
Autor:
Alessandro Erba, Yoshiharu Sakurai, Cesare Pisani, Ryutaro Yamaki, Masayoshi Itou, Masahisa Ito, Lorenzo Maschio
Publikováno v:
Phys. Chem. Chem. Phys.. 13:933-936
The combination of new experimental and theoretical techniques provides evidence of instantaneous electron correlation effects in directional Compton profiles of crystalline silicon, which cannot be reproduced when reference is made to a density matr
Autor:
Hiroshi Sakurai, Masayoshi Itou, Masahisa Ito, Yoshiharu Sakurai, Ryutaro Yamaki, Hiroyuki Nishino
Publikováno v:
Key Engineering Materials. 459:11-14
We have measured magnetic Compton profile of Co/Pd thin films sputtered on a substrate for studying the electronic structure. For the first time, a silicon nitride substrate of 100 nm thickness we used in the magnetic Compton scattering experiment. W
Autor:
Masayoshi Itou, Lorenzo Maschio, Alessandro Erba, A. Terentjevs, Ryutaro Yamaki, Masahisa Ito, Silvia Casassa, Yoshiharu Sakurai, Cesare Pisani
Compton profiles of crystalline silicon with a high statistical accuracy and high-resolution (0.11 a.u. in full width at half-maximum) are measured along the three main crystallographic directions and are compared to the predictions of ab initio simu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e66e49ab94352c9546a435bd8c04e237
http://hdl.handle.net/2318/85386
http://hdl.handle.net/2318/85386