Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Ryuichiro Tamochi"'
Autor:
Jiro Usukura, Akihiro Narita, Tomoharu Matsumoto, Eiji Usukura, Takeshi Sunaoshi, Syunya Watanabe, Yusuke Tamba, Yasuhira Nagakubo, Takashi Mizuo, Junzo Azuma, Masako Osumi, Kazutaka Nimura, Ryuichiro Tamochi, Yoichi Ose
Publikováno v:
Scientific Reports, Vol 11, Iss 1, Pp 1-10 (2021)
Abstract The scanning electron microscope (SEM) has been reassembled into a new type of cryo-electron microscope (cryo-TSEM) by installing a new cryo-transfer holder and anti-contamination trap, which allowed simultaneous acquisition of both transmis
Externí odkaz:
https://doaj.org/article/b8e0ce76230b4113a0fa5d7ebebda2c7
Autor:
Akihiro Narita, Takeshi Sunaoshi, Yoichi Ose, Yusuke Tamba, Masako Osumi, Ryuichiro Tamochi, Junzo Azuma, Tomoharu Matsumoto, Yasuhira Nagakubo, Syunya Watanabe, Kazutaka Nimura, Jiro Usukura, Takashi Mizuo, Eiji Usukura
Publikováno v:
Scientific Reports
Scientific Reports, Vol 11, Iss 1, Pp 1-10 (2021)
Scientific Reports, Vol 11, Iss 1, Pp 1-10 (2021)
The scanning electron microscope (SEM) has been reassembled into a new type of cryo-electron microscope (cryo-TSEM) by installing a new cryo-transfer holder and anti-contamination trap, which allowed simultaneous acquisition of both transmission imag
Autor:
Masako Osumi, Tomoharu Matsumoto, Takashi Mizuo, Junzo Azuma, Takeshi Sunaoshi, Yasuhira Nagakubo, Ryuichiro Tamochi, Akihiro Narita, Syunya Watanabe, Kazutaka Nimura, Yoichi Ose, Eiji Usukura, Jiro Usukura, Yusuke Tamba
A new type of cryo-electron microscopy (cryo-S(T)EM) technique made possible by installing a new cryo-transfer holder and an anti-contamination trap on a scanning electron microscope (Hitachi SU9000) allowed simultaneous collection of both transmissi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef64fc2465a32bdc5e112b3165b32cc0
https://doi.org/10.21203/rs.3.rs-523739/v1
https://doi.org/10.21203/rs.3.rs-523739/v1
Publikováno v:
Biological Field Emission Scanning Electron Microscopy ISBN: 9781118663233
Biological Field Emission Scanning Electron Microscopy
Biological Field Emission Scanning Electron Microscopy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5c28297ba5a19a48b97268839d0e6c56
https://doi.org/10.1002/9781118663233.ch3
https://doi.org/10.1002/9781118663233.ch3
Autor:
Masako Osumi, Junzo Azuma, Akihiro Narita, Yusuke Tamba, Tomoharu Matsumoto, Eiji Usukura, Takeshi Sunaoshi, Jiro Usukura, Yoichi Ose, Yasuhira Nagakubo, Ryuichiro Tamochi
Publikováno v:
Microscopy and Microanalysis. 24:1158-1159
Autor:
Ichiko Misumi, Osamu Sato, Shin-ichi Kitamura, Masatoshi Yasutake, Ryohei Kokawa, Nobuo Kojima, Toru Fujii, Jun-ichiro Kitta, Tomizo Kurosawa, Ryuichiro Tamochi, Satoshi Gonda
Publikováno v:
Measurement Science and Technology. 18:803-812
An intercomparison of nanometric lateral scales, which are special one-dimensional (1D) grating standards with sub-hundred-nanometre pitches, among a deep-ultraviolet (DUV) laser diffractometer, a critical dimension scanning electron microscope (CD-S
Autor:
Yasuhira Nagakubo, Ryuichiro Tamochi, Akihiro Narita, Tomoharu Matsumoto, Yoichi Ose, Masako Osumi, Junzo Azuma, Takeshi Sunaoshi, Jiro Usukura, Eiji Usukura, Yusuke Tamba
Publikováno v:
Microscopy. 66:i6-i6
Autor:
Masako Osumi, Shingo Tahara, Nobuhito Nango, Ryuichiro Tamochi, Nguyen Le Quynh Anh, Yosuke Shida, Wataru Ogasawara, Minaho Fujiwara, Akinari Morikawa, Hitoshi Okada
Publikováno v:
Microscopy. 65:i28.1-i28
Publikováno v:
Practica Oto-Rhino-Laryngologica. 87:123-129
This study estimated the depth of imprint on the tectorial membrane using a new three dimensional measurement system. The tectorial membrane covers the surface of the organ of Corti. The tips of the sensory cell hairs are firmly embedded in the under
Autor:
Hirohisa Okushima, Yasushi Kuroda, Toshihiko Onozuka, Toshie Yaguchi, Kaoru Umemura, Kenji Watanabe, Isao Kawata, Bart Rijpers, Ryuichiro Tamochi, Norio Hasegawa
Publikováno v:
SPIE Proceedings.
This paper presents a novel method of FIB (FIB: focused ion beam) sample preparation to accurately evaluate critical dimensions and profiles of ArF photo resist patterns without the use of a protective coating on the photo resist. In order to accompl